EP 1788436 B1 20130109 - Rework process for photoresist film
Title (en)
Rework process for photoresist film
Title (de)
Nachbearbeitungsverfahren für Fotoresist-Filme
Title (fr)
Procédé de retouche pour films de photoréserves
Publication
Application
Priority
JP 2005331886 A 20051116
Abstract (en)
[origin: EP1788436A1] There is disclosed a rework process for a photoresist film over a substrate having at least an antireflection silicone resin film and the photoresist film over the silicone resin film comprising: at least removing the photoresist film with a solvent while leaving the silicone resin film unremoved; and forming a photoresist film again over the silicone resin film. In this case, the substrate over which the photoresist film is reworked can have an organic film under the silicone resin film. There can be provided a rework process for a photoresist film that can be conducted more easily at lower cost.
IPC 8 full level
G03F 7/09 (2006.01); G03F 7/40 (2006.01); G03F 7/42 (2006.01)
CPC (source: EP KR US)
G03F 7/091 (2013.01 - EP US); G03F 7/11 (2013.01 - KR); G03F 7/40 (2013.01 - EP US); G03F 7/422 (2013.01 - EP US)
Citation (examination)
- EP 1580825 A1 20050928 - ROHM & HAAS [US]
- WO 0022481 A1 20000420 - CLARIANT INT LTD [CH]
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 1788436 A1 20070523; EP 1788436 B1 20130109; KR 101127265 B1 20120412; KR 20070052215 A 20070521; TW 200727084 A 20070716; TW I390355 B 20130321; US 2007111134 A1 20070517; US 7642043 B2 20100105
DOCDB simple family (application)
EP 06255214 A 20061010; KR 20060112846 A 20061115; TW 95142427 A 20061116; US 54455206 A 20061010