EP 1791624 A1 20070606 - DEVICE FOR GAS SEPARATION AND METHOD FOR PRODUCING ONE SUCH DEVICE
Title (en)
DEVICE FOR GAS SEPARATION AND METHOD FOR PRODUCING ONE SUCH DEVICE
Title (de)
VORRICHTUNG ZUR GASSEPARATION SOWIE VERFAHREN ZUR HERSTELLUNG EINER SOLCHEN VORRICHTUNG
Title (fr)
DISPOSITIF DE SEPARATION DE GAZ ET PROCEDE POUR PRODUIRE UN TEL DISPOSITIF
Publication
Application
Priority
- DE 2005001442 W 20050813
- DE 102004046310 A 20040924
Abstract (en)
[origin: WO2006032230A1] The invention relates to a method for producing a device for gas separation, said device comprising a layer system wherein a functional layer consisting of Ti0<SUB>2</SUB> and/or Zr0<SUB>2</SUB> having an average pore diameter of less than 1 nm is applied to at least one side of a carrier layer that is porous throughout. Said carrier layer is preferably between 100 ?m and 1 mm thick and comprises continuous pores with an average pore diameter in the ?m range. The functional layer which is applied directly or by means of at least one intermediate layer comprises continuous pores with an average pore diameter of less than 1 nm, especially less than 0.8 nm. The functional layer can advantageously be embodied as a graduated layer. The invention is especially characterised by the symmetrical structure of the device, in which functional layers are applied to both sides of the carrier layer, optionally by means of respectively at least one intermediate layer.
IPC 8 full level
B01D 71/02 (2006.01); B01D 53/22 (2006.01)
CPC (source: EP US)
B01D 53/228 (2013.01 - EP US); B01D 67/0048 (2013.01 - EP US); B01D 67/0072 (2013.01 - EP US); B01D 69/02 (2013.01 - EP US); B01D 69/106 (2022.08 - EP US); B01D 69/108 (2022.08 - EP US); B01D 71/024 (2013.01 - EP US); B01D 2325/0232 (2022.08 - EP US); B01D 2325/04 (2013.01 - EP US); B01D 2325/22 (2013.01 - EP US); B01D 2325/30 (2013.01 - EP US); Y10T 428/2495 (2015.01 - EP US); Y10T 428/249961 (2015.04 - EP US); Y10T 428/249979 (2015.04 - EP US); Y10T 428/24998 (2015.04 - EP US)
Citation (search report)
See references of WO 2006032230A1
Citation (examination)
- US 4935139 A 19900619 - DAVIDSON ALEXANDER P [GB], et al
- WO 2005023403 A1 20050317 - KOREA RES INST CHEM TECH [KR], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2006032230 A1 20060330; AU 2005287770 A1 20060330; AU 2005287770 B2 20100204; CA 2581419 A1 20060330; CN 101031352 A 20070905; DE 102004046310 A1 20060406; EP 1791624 A1 20070606; JP 2008514387 A 20080508; US 2009193975 A1 20090806; US 8016924 B2 20110913
DOCDB simple family (application)
DE 2005001442 W 20050813; AU 2005287770 A 20050813; CA 2581419 A 20050813; CN 200580032239 A 20050813; DE 102004046310 A 20040924; EP 05774386 A 20050813; JP 2007532756 A 20050813; US 66355105 A 20050813