EP 1803148 A1 20070704 - METHOD FOR PRODUCING SUBMICRON STRUCTURES
Title (en)
METHOD FOR PRODUCING SUBMICRON STRUCTURES
Title (de)
VERFAHREN ZUR HERSTELLUNG VON SUBMIKRONSTRUKTUREN
Title (fr)
PROCEDE DE FABRICATION DE STRUCTURES A L'ECHELLE DU SOUS-MICRON
Publication
Application
Priority
- DE 2005001852 W 20051017
- DE 102004051662 A 20041022
Abstract (en)
[origin: WO2006042519A1] The invention relates to a method for producing submicron structures using a shadow mask, whereby a material charge and/or energy charge occurs through the openings of the shadow mask. Said method comprises the following steps: a film which is used as a shadow mask and which is made of a masking material is applied to the substrate, tears are produced in said film, said tears extending until the substrate, edge areas of the film arranged on the tears are detached thereby exposing the substrate and the material or the energy is applied to the exposed substrate by the tears, also above the exposed edge area of the shadow mask film.
IPC 8 full level
H01L 21/033 (2006.01); H01L 21/027 (2006.01); H01L 21/335 (2006.01); H01L 21/336 (2006.01); H01L 29/76 (2006.01)
CPC (source: EP US)
B82Y 10/00 (2013.01 - EP US); H01L 21/0272 (2013.01 - EP US); H01L 21/0337 (2013.01 - EP US); H01L 21/3086 (2013.01 - EP US); H01L 29/0665 (2013.01 - EP US); H01L 29/0673 (2013.01 - EP US); H01L 29/66439 (2013.01 - EP US); H01L 29/66742 (2013.01 - EP US); H01L 21/02603 (2013.01 - EP US); H01L 21/02639 (2013.01 - EP US)
Citation (search report)
See references of WO 2006042519A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
DE 102004051662 B3 20060420; EP 1803148 A1 20070704; US 2008090181 A1 20080417; US 7718349 B2 20100518; WO 2006042519 A1 20060427
DOCDB simple family (application)
DE 102004051662 A 20041022; DE 2005001852 W 20051017; EP 05804015 A 20051017; US 66601305 A 20051017