Global Patent Index - EP 1807556 A2

EP 1807556 A2 20070718 - METHOD FOR GROWING Si-Ge SEMICONDUCTOR MATERIALS AND DEVICES ON SUBSTRATES

Title (en)

METHOD FOR GROWING Si-Ge SEMICONDUCTOR MATERIALS AND DEVICES ON SUBSTRATES

Title (de)

VERFAHREN ZUM ZIEHEN VON SI-GE-HALBLEITERMATERIALIEN UND BAUELEMENTEN AUF SUBSTRATEN

Title (fr)

METHODE DE CROISSANCE PAR EPITAXIE DE MATERIAUX ET DE DISPOSITIFS A SEMI-CONDUCTEURS SI-GE SUR DES SUBSTRATS

Publication

EP 1807556 A2 20070718 (EN)

Application

EP 05746524 A 20050408

Priority

  • US 2005012157 W 20050408
  • US 61012004 P 20040914
  • US 2004043854 W 20041231
  • US 66077905 P 20050311

Abstract (en)

[origin: WO2006031257A2] A method is provided for growing Si-Ge materials on Si(100) with Ge-rich contents (Ge>50 at.%) and precise stoichiometries SiGe, SiGe<sub

IPC 8 full level

H01L 21/20 (2006.01); H01L 29/161 (2006.01); H01L 29/20 (2006.01); H01L 29/22 (2006.01)

CPC (source: EP KR)

B82Y 10/00 (2013.01 - EP); B82Y 30/00 (2013.01 - EP); C30B 25/00 (2013.01 - KR); C30B 25/02 (2013.01 - EP); C30B 29/52 (2013.01 - EP); H01L 21/02381 (2013.01 - EP); H01L 21/02422 (2013.01 - EP); H01L 21/02532 (2013.01 - EP); H01L 21/02587 (2013.01 - EP); H01L 21/0262 (2013.01 - EP); H01L 21/02636 (2013.01 - EP); H01L 21/20 (2013.01 - KR)

Designated contracting state (EPC)

DE FR

DOCDB simple family (publication)

WO 2006031257 A2 20060323; WO 2006031257 A3 20060908; EP 1807556 A2 20070718; EP 1807556 A4 20110302; KR 101060372 B1 20110829; KR 20070083681 A 20070824

DOCDB simple family (application)

US 2005012157 W 20050408; EP 05746524 A 20050408; KR 20077008535 A 20050408