Global Patent Index - EP 1820233 A2

EP 1820233 A2 20070822 - GAS-TIGHT ELECTROLYTE LAYER AND METHOD FOR THE PRODUCTION THEREOF

Title (en)

GAS-TIGHT ELECTROLYTE LAYER AND METHOD FOR THE PRODUCTION THEREOF

Title (de)

GASDICHTE ELEKTROLYTSCHICHT SOWIE VERFAHREN ZUR HERSTELLUNG

Title (fr)

COUCHE D'ELECTROLYTE ETANCHE AUX GAZ ET SON PROCEDE DE PRODUCTION

Publication

EP 1820233 A2 20070822 (DE)

Application

EP 05814342 A 20051028

Priority

  • DE 2005001935 W 20051028
  • DE 102004054982 A 20041113

Abstract (en)

[origin: WO2006050692A2] The invention relates to a method for producing a gas-tight solid electrolyte layer, in which an electrolyte layer that is applied to a substrate and is unsintered or has been presintered at temperatures below 1150<SUP>o </SUP>C is first infiltrated at least once with a fluid containing zirconium and is dried and optionally baked. The fully infiltrated electrolyte layer is then sintered at temperatures lying below 1400<SUP>o </SUP>C. The electrolyte layer produced according to the inventive method is advantageously provided with very low leakage rates of less than 5*10<SUP>-5</SUP> mbar*l/s*cm<SUP>2</SUP>, which are determined at a differential pressure of 100 mbar by means of a helium leakage test apparatus.

IPC 8 full level

H01M 8/12 (2006.01)

CPC (source: EP)

H01M 8/1253 (2013.01); H01M 2008/1293 (2013.01); H01M 2300/0077 (2013.01); Y02E 60/50 (2013.01); Y02P 70/50 (2015.11)

Citation (search report)

See references of WO 2006050692A3

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA HR MK YU

DOCDB simple family (publication)

WO 2006050692 A2 20060518; WO 2006050692 A3 20070809; DE 102004054982 A1 20060524; EP 1820233 A2 20070822

DOCDB simple family (application)

DE 2005001935 W 20051028; DE 102004054982 A 20041113; EP 05814342 A 20051028