EP 1831433 A2 20070912 - ELECTROCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS
Title (en)
ELECTROCHEMICAL DEPOSITION OF TANTALUM AND/OR COPPER IN IONIC LIQUIDS
Title (de)
ELEKTROCHEMISCHE ABSCHEIDUNG VON TANTAL UND/ODER KUPFER IN IONISCHEN FL]SSIGKEITEN
Title (fr)
DEPOT ELECTROCHIMIQUE DE TANTALE ET/OU DE CUIVRE DANS DES LIQUIDES IONIQUES
Publication
Application
Priority
- EP 2005012180 W 20051115
- DE 102004059520 A 20041210
Abstract (en)
[origin: WO2006061081A2] The invention relates to a method for electrochemical deposition of tantalum and/or copper on a substrate in an ionic liquid, containing at least one tetraalkylammonium-, tetraalkylphosphonium-, 1,1-dialkylpyrrolidinium-, 1-hydroxyalkyl-1-alkylpyrrolidinium-, 1-hydroxyalkyl-3-alkylimidazolium- or bis(1-hydroxyalkyl)imidazolium cation, whereby the alkyl groups or the alkylene chains of the 1-hydroxyalkyl groups can independently have 1 to 10 C atoms.
IPC 8 full level
C25D 3/66 (2006.01)
CPC (source: EP KR US)
C25D 3/38 (2013.01 - EP KR US); C25D 3/54 (2013.01 - EP KR US); C25D 3/665 (2013.01 - EP US); C25D 5/10 (2013.01 - EP US); C25D 5/617 (2020.08 - EP US); C25D 7/12 (2013.01 - EP KR US)
Citation (search report)
See references of WO 2006061081A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK YU
DOCDB simple family (publication)
DE 102004059520 A1 20060614; CA 2590080 A1 20060615; CN 101076617 A 20071121; EP 1831433 A2 20070912; JP 2008523242 A 20080703; KR 20070085936 A 20070827; RU 2007125776 A 20090120; TW 200626755 A 20060801; US 2009242414 A1 20091001; WO 2006061081 A2 20060615; WO 2006061081 A3 20070802
DOCDB simple family (application)
DE 102004059520 A 20041210; CA 2590080 A 20051115; CN 200580042516 A 20051115; EP 05813986 A 20051115; EP 2005012180 W 20051115; JP 2007544757 A 20051115; KR 20077012973 A 20070608; RU 2007125776 A 20051115; TW 94143756 A 20051209; US 72127705 A 20051115