EP 1832353 A2 20070912 - Photolithography mask cleaning
Title (en)
Photolithography mask cleaning
Title (de)
Reinigung von Photolithographiemasken
Title (fr)
Nettoyage de masques de photolithographie
Publication
Application
Priority
FR 0650805 A 20060308
Abstract (en)
The method involves carrying out thermal processing of a photolithography mask (10) at a pressure lower than atmospheric pressure and at a temperature higher than an ambient temperature (Tamb) to obtain the vaporization of salts (s) accumulated on a surface of the mask. The thermal processing is carried out in a clean room of an electronic industry and is obtained by focalized radiation on the surface to be cleaned. An independent claim is also included for a photolithography mask cleaning device.
Abstract (fr)
L'invention concerne un procédé et un équipement de nettoyage de masques (10) utilisés pour des étapes de photolithographie, comportant au moins une étape (23, 24) de traitement thermique sous pompage à une pression inférieure à la pression atmosphérique et à une température supérieure à la température ambiante.
IPC 8 full level
CPC (source: EP US)
B08B 7/0071 (2013.01 - EP US); G03F 1/82 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB IT
Designated extension state (EPC)
AL BA HR MK YU
DOCDB simple family (publication)
EP 1832353 A2 20070912; EP 1832353 A3 20090506; US 2007209682 A1 20070913; US 7927969 B2 20110419
DOCDB simple family (application)
EP 07103722 A 20070307; US 71512507 A 20070307