EP 1842098 A1 20071010 - METHOD FOR REMOVING DEFECTIVE MATERIAL FROM A LITHOGRAPHY MASK
Title (en)
METHOD FOR REMOVING DEFECTIVE MATERIAL FROM A LITHOGRAPHY MASK
Title (de)
VERFAHREN ZUM ENTFERNEN VON DEFEKTMATERIAL EINER LITHOGRAPHIEMASKE
Title (fr)
PROCEDE D'ELIMINATION D'UNE MATIERE RESIDUELLE SUR UN MASQUE DE LITHOGRAPHIE
Publication
Application
Priority
- EP 2006000660 W 20060126
- DE 102005004070 A 20050128
Abstract (en)
[origin: DE102005004070B3] The method involves removing a defective material (40) and an absorbing material (3) of a lithographic mask in a processing zone by a focused ion beam. The mask is subjected to a cleaning process after the removal of the defective material. An absorbing material is applied in an outer region, which is dependent on a portion of the processing zone, to form a transmitting region (1) having a desired phase difference on the mask. An independent claim is also included for a lithographic mask with a transmitting region.
IPC 8 full level
G03F 1/00 (2006.01)
CPC (source: EP KR US)
G03F 1/68 (2013.01 - KR); G03F 1/72 (2013.01 - KR); G03F 1/74 (2013.01 - EP US)
Citation (search report)
See references of WO 2006079529A1
Designated contracting state (EPC)
FR
DOCDB simple family (publication)
DE 102005004070 B3 20060803; EP 1842098 A1 20071010; JP 2007534993 A 20071129; KR 100841036 B1 20080624; KR 20070042921 A 20070424; TW 200627076 A 20060801; US 2007037071 A1 20070215; WO 2006079529 A1 20060803
DOCDB simple family (application)
DE 102005004070 A 20050128; EP 06703614 A 20060126; EP 2006000660 W 20060126; JP 2007510047 A 20060126; KR 20067026053 A 20061211; TW 94147731 A 20051230; US 51070106 A 20060828