EP 1853745 A2 20071114 - RUTHENIUM LAYER DEPOSITION APPARATUS AND METHOD
Title (en)
RUTHENIUM LAYER DEPOSITION APPARATUS AND METHOD
Title (de)
VORRICHTUNG UND VERFAHREN ZUR ABSCHEIDUNG EINER RUTHENIUMSCHICHT
Title (fr)
APPAREIL ET PROCEDE DE DEPORT DE COUCHE DE RUTHENIUM
Publication
Application
Priority
- US 2006002461 W 20060125
- US 64800405 P 20050127
- US 71502405 P 20050908
- US 22842505 A 20050915
- US 22864905 A 20050915
Abstract (en)
[origin: WO2006081234A2] Embodiments of the invention provide apparatuses and methods for forming a ruthenium-containing layer on a substrate surface from a ruthenium tetroxide containing gas. Generally, the method includes exposing a substrate surface to a ruthenium tetroxide vapor to form a catalytic layer on the substrate surface and subsequently filling device structures on the substrate surface by at least one deposition process. In one embodiment, the ruthenium containing layer is formed on a substrate surface by creating ruthenium tetroxide in an external vessel and then delivering the generated ruthenium tetroxide gas to a temperature controlled substrate surface positioned within a processing chamber. In another embodiment, a ruthenium containing layer is formed on a substrate surface, using the ruthenium tetroxide containing solvent. In another embodiment, the solvent is separated from a ruthenium tetroxide containing solvent mixture and the remaining ruthenium tetroxide is used to form a ruthenium containing layer on the substrate surface.
IPC 8 full level
C23C 16/00 (2006.01)
CPC (source: EP KR)
C23C 16/06 (2013.01 - EP KR); C23C 16/4488 (2013.01 - EP KR); C23C 16/5096 (2013.01 - EP KR); H01L 21/28556 (2013.01 - EP KR); H01L 21/28562 (2013.01 - EP KR); H01L 21/76843 (2013.01 - EP KR); H01L 21/76846 (2013.01 - EP KR); H01L 21/76873 (2013.01 - EP KR)
Citation (search report)
See references of WO 2006081234A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK YU
DOCDB simple family (publication)
WO 2006081234 A2 20060803; WO 2006081234 A3 20090507; EP 1853745 A2 20071114; JP 2008538796 A 20081106; JP 5043684 B2 20121010; KR 101014240 B1 20110216; KR 20070101357 A 20071016; TW 200702474 A 20070116; TW I349717 B 20111001
DOCDB simple family (application)
US 2006002461 W 20060125; EP 06733844 A 20060125; JP 2007553170 A 20060125; KR 20077019546 A 20060125; TW 95103189 A 20060126