EP 1891405 A2 20080227 - METHOD AND APPARATUS FOR MEASURING FILM THICKNESS AND FILM THICKNESS GROWTH
Title (en)
METHOD AND APPARATUS FOR MEASURING FILM THICKNESS AND FILM THICKNESS GROWTH
Title (de)
VERFAHREN UND VORRICHTUNG ZUM MESSEN DER SCHICHTDICKE UND DES WACHSTUMS DER SCHICHTDICKE
Title (fr)
PROCEDE ET APPAREIL POUR MESURER L'EPAISSEUR D'UN FILM ET LA CROISSANCE DE L'EPAISSEUR D'UN FILM
Publication
Application
Priority
- US 2006023678 W 20060619
- US 69163805 P 20050617
Abstract (en)
[origin: WO2006138678A2] A device for measuring thickness and/or rate of thickness increase of a film comprises at least one piezoelectric element, and first and second electrodes. A method of measuring thickness and/or rate of thickness increase of a film comprises applying a voltage across a piezoelectric element from a first electrode to a second electrode, thereby causing the piezoelectric element to vibrate, and measuring the rate of vibration of the piezoelectric element. Heat and/or cooling may be applied to the piezoelectric element. The piezoelectric element may be formed of quartz crystal, e.g., doubly rotated cut quartz crystal having a value for in the range of from about (33) degrees to about (36) degrees and a value for in the range of from about (18) degrees to about (20) degrees. Alternatively or additionally, the piezoelectric element may comprise a crystal having at least a first curved surface.
IPC 8 full level
G01H 13/00 (2006.01); G01B 7/06 (2006.01); G01N 29/12 (2006.01)
CPC (source: EP)
G01B 7/066 (2013.01); G01N 29/12 (2013.01); G01N 2291/0251 (2013.01)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2006138678 A2 20061228; WO 2006138678 A3 20070208; EP 1891405 A2 20080227; EP 1891405 A4 20140122
DOCDB simple family (application)
US 2006023678 W 20060619; EP 06773455 A 20060619