EP 1902156 A2 20080326 - METHOD FOR TREATING PLASMA AND/OR COVERING PLASMA OF WORKPIECES UNDER CONTINUOUS ATMOSPHERIC PRESSURE
Title (en)
METHOD FOR TREATING PLASMA AND/OR COVERING PLASMA OF WORKPIECES UNDER CONTINUOUS ATMOSPHERIC PRESSURE
Title (de)
VERFAHREN ZUR KONTINUIERLICHEN ATMOSPHÄRENDRUCK PLASMABEHANDLUNG UND/ODER BESCHICHTUNG VON WERKSTÜCKEN
Title (fr)
PROCEDE DE TRAITEMENT PLASMA ET/OU DE REVETEMENT PLASMA EN PRESSION ATMOSPHERIQUE CONTINUE DE PIECES D'USINAGE
Publication
Application
Priority
- EP 2006005838 W 20060619
- DE 102005029360 A 20050624
Abstract (en)
[origin: DE102005029360A1] Method for continuous plasma treatment or coating of electrically insulated workpieces under atmospheric pressure, especially plates or strip, where the workpiece is located below a high voltage, preferably ac electrode which extends transversely in the movement direction over the width of the workpiece surface, where the electrode and workpiece are offset in the movement direction. A first chamber between the electrode and workpiece is filled with a first atmosphere and a second chamber on the workpiece side oriented away from the eletrode and adjacent to its rear side is filled with a second, different from the first atmosphere. The high voltage and the two atmospheres are selected so that a plasma discharge is provoked in the second atmosphere.
IPC 8 full level
C23C 16/50 (2006.01); C23C 16/54 (2006.01)
CPC (source: EP US)
C23C 16/50 (2013.01 - EP US); C23C 16/545 (2013.01 - EP US); H01J 37/32348 (2013.01 - EP US); H05H 1/2406 (2013.01 - EP US); H05H 1/2418 (2021.05 - EP); H05H 1/2437 (2021.05 - EP); H05H 1/2418 (2021.05 - US); H05H 1/2437 (2021.05 - US)
Citation (search report)
See references of WO 2007000255A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
DE 102005029360 A1 20061228; DE 102005029360 B4 20111110; AT E432379 T1 20090615; AT E533339 T1 20111115; CN 101198718 A 20080611; CN 101198718 B 20100526; DE 502006003822 D1 20090709; DK 1902156 T3 20090824; EP 1894449 A2 20080305; EP 1894449 B1 20111109; EP 1902156 A2 20080326; EP 1902156 B1 20090527; JP 2008547166 A 20081225; PL 1894449 T3 20120430; US 2010112235 A1 20100506; US 2010221451 A1 20100902; US 7989034 B2 20110802; WO 2007000255 A2 20070104; WO 2007000255 A3 20070426; WO 2007016999 A2 20070215; WO 2007016999 A3 20090903
DOCDB simple family (application)
DE 102005029360 A 20050624; AT 06754430 T 20060619; AT 06762073 T 20060619; CN 200680021498 A 20060619; DE 502006003822 T 20060619; DK 06762073 T 20060619; EP 06754430 A 20060619; EP 06762073 A 20060619; EP 2006005838 W 20060619; EP 2006005839 W 20060619; JP 2008517388 A 20060619; PL 06754430 T 20060619; US 99309506 A 20060619; US 99336206 A 20060619