EP 1903370 A1 20080326 - An optical reduction system for use in photolithography
Title (en)
An optical reduction system for use in photolithography
Title (de)
Optisches Reduktionssystem für die Fotolithografie
Title (fr)
Système de réduction optique pour photolithographie
Publication
Application
Priority
- EP 01117229 A 20010716
- US 62088600 A 20000721
Abstract (en)
A catadioptric projection optical system for use in photolithography used in manufacturing semiconductors. The present invention provides a projection optics system having a numerical aperture of 0.75 for use with wavelengths in the 248, 193, and 157 nanometer range. The object and image locations are separated by a predetermined distance, making possible retrofitting of older optical systems. In particular, the present invention presents preferred configurations of the optical reduction system including the construction data of the optical elements.
IPC 8 full level
G02B 5/30 (2006.01); G02B 13/18 (2006.01); G02B 17/08 (2006.01); G02B 27/18 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G02B 17/08 (2013.01 - EP US); G02B 17/0892 (2013.01 - EP US); G02B 27/18 (2013.01 - KR); G03F 7/70225 (2013.01 - EP US)
Citation (applicant)
US 5537260 A 19960716 - WILLIAMSON DAVID M [GB]
Citation (search report)
- [A] EP 0608572 A2 19940803 - SVG LITHOGRAPHY SYSTEMS INC [US]
- [A] WO 9532446 A1 19951130 - ZEISS CARL [DE], et al
- [A] PATENT ABSTRACTS OF JAPAN vol. 1996, no. 12 26 December 1996 (1996-12-26)
- [A] PATENT ABSTRACTS OF JAPAN vol. 015, no. 514 (E - 1150) 27 December 1991 (1991-12-27)
Designated contracting state (EPC)
DE FR GB IT NL
Designated extension state (EPC)
AL LT LV MK RO SI
DOCDB simple family (publication)
EP 1174749 A2 20020123; EP 1174749 A3 20031217; EP 1174749 B1 20071128; CA 2352088 A1 20020121; DE 60131603 D1 20080110; DE 60131603 T2 20080410; EP 1903370 A1 20080326; JP 2002090626 A 20020327; JP 4236397 B2 20090311; KR 100751446 B1 20070823; KR 20020008756 A 20020131; US 6486940 B1 20021126
DOCDB simple family (application)
EP 01117229 A 20010716; CA 2352088 A 20010704; DE 60131603 T 20010716; EP 07022988 A 20010716; JP 2001221852 A 20010723; KR 20010043034 A 20010718; US 62088600 A 20000721