EP 1920227 A1 20080514 - DEVICE AND METHOD FOR THE INTERFEROMETRIC MEASUREMENT OF PHASE MASKS
Title (en)
DEVICE AND METHOD FOR THE INTERFEROMETRIC MEASUREMENT OF PHASE MASKS
Title (de)
VORRICHTUNG UND VERFAHREN ZUR INTERFEROMETRISCHEN MESSUNG VON PHASENMASKEN
Title (fr)
DISPOSITIF ET PROCEDE DE MESURE INTERFEROMETRIQUE DE MASQUES DE PHASES
Publication
Application
Priority
- EP 2006008502 W 20060831
- DE 102005041203 A 20050831
Abstract (en)
[origin: DE102005041203A1] A phase mask (4), positionable in X-Y direction, is arranged between and close to the pupil levels of two aligned imaging lenses (2). A coherency mask (1) and a diffraction grating (3) are arranged over the imaging lenses. By translational shifting of the coherence mask and/or the diffraction grating in X-Y direction, a phase shifting interferogram is produced and is imaged over the phase mask by another imaging lens (5) on a spatial light detector (6). Phase and transmission function of the phase mask are evaluated.
IPC 8 full level
G01J 9/02 (2006.01); G01B 9/02 (2006.01); G03F 1/00 (2012.01)
CPC (source: EP KR US)
G01B 9/02 (2013.01 - KR); G01J 9/02 (2013.01 - EP KR US); G01J 9/0215 (2013.01 - EP US); G03F 1/84 (2013.01 - EP US); G03F 7/70283 (2013.01 - EP US); G03F 7/70591 (2013.01 - EP US); G03F 1/26 (2013.01 - EP US)
Citation (search report)
See references of WO 2007025746A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
DE 102005041203 A1 20070301; EP 1920227 A1 20080514; JP 2009506335 A 20090212; KR 20080041671 A 20080513; US 2008231862 A1 20080925; US 7911624 B2 20110322; WO 2007025746 A1 20070308
DOCDB simple family (application)
DE 102005041203 A 20050831; EP 06777129 A 20060831; EP 2006008502 W 20060831; JP 2008528416 A 20060831; KR 20087005072 A 20080229; US 6527506 A 20060831