Global Patent Index - EP 1938364 A1

EP 1938364 A1 20080702 - A METHOD FOR FABRICATING NANOGAP AND NANOGAP SENSOR

Title (en)

A METHOD FOR FABRICATING NANOGAP AND NANOGAP SENSOR

Title (de)

VERFAHREN ZUR ERZEUGUNG EINES NANOSPALTS UND NANOSPALTSENSOR

Title (fr)

PROCEDE POUR FABRIQUER UN NANO-INTERVALLE ET CAPTEUR DE NANO-INTERVALLE

Publication

EP 1938364 A1 20080702 (EN)

Application

EP 06783773 A 20060905

Priority

  • KR 2006003517 W 20060905
  • KR 20050099585 A 20051021
  • KR 20060072981 A 20060802

Abstract (en)

[origin: WO2007046582A1] The present invention relates to a method of fabricating a nanogap and a nanogap sensor, and to a nanogap and a nanogap sensor fabricated using the method. The present invention relates to a method of fabricating a nanogap and a nanogap sensor, which can be realized by an anisotropic etching using a semiconductor manufacturing process. According to the method of present invention, the nanogap and nanogap sensor can be simply and cheaply produced in large quantities.

IPC 8 full level

B81C 1/00 (2006.01)

CPC (source: EP)

B81C 1/00087 (2013.01)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

DOCDB simple family (publication)

WO 2007046582 A1 20070426; EP 1938364 A1 20080702; EP 1938364 A4 20110518

DOCDB simple family (application)

KR 2006003517 W 20060905; EP 06783773 A 20060905