EP 1957247 B1 20101117 - APPARATUS AND METHOD FOR CLEANING A SAWN WAFER BLOCK
Title (en)
APPARATUS AND METHOD FOR CLEANING A SAWN WAFER BLOCK
Title (de)
VORRICHTUNG UND VERFAHREN ZUM REINIGEN EINES GESÄGTEN WAFERBLOCKS
Title (fr)
DISPOSITIF ET PROCÉDÉ DE NETTOYAGE D'UN BLOC SCIE DE GALETTES SEMI-CONDUCTRICES
Publication
Application
Priority
- EP 2006011724 W 20061206
- DE 102005058269 A 20051206
Abstract (en)
[origin: US2008308125A1] An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning basin, at least a portion of the wafer block having sawn gaps is disposed in the cleaning liquid, at least one outlet port in a bottom region of the cleaning basin, and a closer for the outlet port, by means of which the outlet port may be opened and closed. The closer, the outlet port and the bottom region of the cleaning basin are configured such that, by opening the closer the cleaning liquid is drainable so fast from at least the area of the cleaning basin having the wafer block disposed therein that contaminants are removable from the sawn gaps due to a suction effect of the cleaning liquid.
IPC 8 full level
B28D 5/00 (2006.01)
CPC (source: EP US)
B28D 5/0076 (2013.01 - EP US)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
US 2008308125 A1 20081218; AT E488345 T1 20101215; CA 2632387 A1 20071206; CA 2632387 C 20120417; CA 2719395 A1 20071206; DE 102005058269 A1 20070614; DE 102005058269 B4 20111201; DE 502006008357 D1 20101230; EP 1957247 A1 20080820; EP 1957247 B1 20101117; MY 141037 A 20100225; WO 2007065665 A1 20070614
DOCDB simple family (application)
US 9622706 A 20061206; AT 06829352 T 20061206; CA 2632387 A 20061206; CA 2719395 A 20061206; DE 102005058269 A 20051206; DE 502006008357 T 20061206; EP 06829352 A 20061206; EP 2006011724 W 20061206; MY PI20081980 A 20080606