Global Patent Index - EP 1994446 A1

EP 1994446 A1 20081126 - SLM LITHOGRAPHY: PRINTING TO BELOW K1=.30 WITHOUT PREVIOUS OPC PROCESSING

Title (en)

SLM LITHOGRAPHY: PRINTING TO BELOW K1=.30 WITHOUT PREVIOUS OPC PROCESSING

Title (de)

SLM-LITHOGRAPHIE: DRUCK UNTER K1=0,30 OHNE VORHERIGE OPC-VERARBEITUNG

Title (fr)

LITHOGRAPHIE PAR MODULATEUR SPATIAL DE LUMIÈRE: IMPRESSION EN DESSOUS DE K1 = 30 SANS TRAITEMENT PAR CORRECTION DE PROXIMITE OPTIQUE PREALABLE

Publication

EP 1994446 A1 20081126 (EN)

Application

EP 07703561 A 20070226

Priority

  • EP 2007001638 W 20070226
  • US 77627506 P 20060224

Abstract (en)

[origin: WO2007096195A1] Previously disclosed methods and devices are extended in this application by two-dimensional analysis of optical proximity interactions and by fashioning a computationally efficient kernel for rapid calculation of adjustments to be made. The computations can be made in realtime, whereby the use of OPC assist features can be reduced, with substantial savings in file size and computational requirements.

IPC 8 full level

G03F 7/20 (2006.01)

CPC (source: EP KR)

G03F 7/70125 (2013.01 - EP KR); G03F 7/70283 (2013.01 - EP KR); G03F 7/70291 (2013.01 - EP KR); G03F 7/70308 (2013.01 - EP KR); G03F 7/704 (2013.01 - KR); G03F 7/70441 (2013.01 - EP KR); G03F 7/70508 (2013.01 - EP KR); G03F 7/70566 (2013.01 - EP KR)

Citation (search report)

See references of WO 2007096195A1

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR

DOCDB simple family (publication)

WO 2007096195 A1 20070830; EP 1994446 A1 20081126; JP 2009527911 A 20090730; KR 20080106293 A 20081204

DOCDB simple family (application)

EP 2007001638 W 20070226; EP 07703561 A 20070226; JP 2008555711 A 20070226; KR 20087023348 A 20080924