GPI coverage and content

You can use Global Patent Index (GPI) to carry out detailed searches in the EPO's worldwide bibliographic (DOCDB), legal event (INPADOC) and full-text data sets, and download or visualise the search results for statistical analysis.

Current content: 157 484 516 patent documents

This week's update (26/07/2024 12:00 CET):

147 225 new documents added

921 612 documents amended

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EP 2002028 A2 20081217 - VENT GROOVE MODIFIED SPUTTER TARGET ASSEMBLY

Title (en)

VENT GROOVE MODIFIED SPUTTER TARGET ASSEMBLY

Title (de)

SPUTTERTARGETANORDNUNG MIT MODIFIZIERTER ENTLÜFTUNGSRILLE

Title (fr)

ENSEMBLE CIBLE DE PULVÉRISATION À RAINURE D'ÉVENT MODIFIÉE

Publication

EP 2002028 A2 20081217 (EN)

Application

EP 07754627 A 20070403

Priority

US 2007008130 W 20070403
US 78871506 P 20060404
US 73110507 A 20070330

Abstract (en)

[origin: WO2007114899A2] A sputter target assembly (105) including vent grooves (420) having a certain configuration so as to reduce target (110) arcing during the physical vapor deposition of a film.

IPC 8 full level

C23C 14/34 (2006.01)

CPC (source: EP KR)

C23C 14/3407 (2013.01 - EP KR); C23C 14/54 (2013.01 - KR); C23C 14/564 (2013.01 - KR)

Citation (search report)

See references of WO 2007114899A2

Designated contracting state (EPC)

DE FR GB IE IT

DOCDB simple family (publication)

WO 2007114899 A2 20071011; WO 2007114899 A3 20071122; EP 2002028 A2 20081217; KR 20080106463 A 20081205; SG 173342 A1 20110829

DOCDB simple family (application)

US 2007008130 W 20070403; EP 07754627 A 20070403; KR 20087024147 A 20081002; SG 2011048725 A 20070403