Global Patent Index - EP 2002029 A1

EP 2002029 A1 20081217 - METHOD FOR PRODUCING A THERMAL BARRIER COATING AND THERMAL BARRIER COATING FOR A COMPONENT PART

Title (en)

METHOD FOR PRODUCING A THERMAL BARRIER COATING AND THERMAL BARRIER COATING FOR A COMPONENT PART

Title (de)

VERFAHREN ZUR HERSTELLUNG EINER WÄRMEDÄMMSCHICHT UND WÄRMEDÄMMSCHICHT FÜR EIN BAUTEIL

Title (fr)

PROCÉDÉ DE FABRICATION D'UNE COUCHE D'ISOLATION THERMIQUE ET COUCHE D'ISOLATION THERMIQUE POUR UN ÉLÉMENT DE CONSTRUCTION

Publication

EP 2002029 A1 20081217 (DE)

Application

EP 07764320 A 20070302

Priority

  • DE 2007000390 W 20070302
  • DE 102006010860 A 20060309

Abstract (en)

[origin: DE102006010860A1] The production of a ceramic heat-insulating layer on a component for use in compressor and turbine units comprises the preparation of a ceramic vapor for deposition on the component, deposition of vapor on the component for the formation of a column- or pole-like heat-insulating layer and variation of a process parameter during the deposition of ceramic vapor. The heat-insulating layer comprises columns or poles (12), which alternatingly exhibit decreasing and increasing diameters (d, D). The columns or poles are aligned essentially perpendicular to a component surface (16). The production of a ceramic heat-insulating layer on a component for use in compressor and turbine units comprises the preparation of a ceramic vapor for deposition on the component, deposition of vapor on the component for the formation of a column- or pole-like heat-insulating layer and variation of a process parameter during deposition of the ceramic vapor. The heat-insulating layer comprises columns or poles (12), which alternatingly exhibit decreasing and increasing diameters (d, D). The columns or poles are aligned essentially perpendicular to a component surface (16). The turbine units comprise physical vapor deposition, which is electron beam vapor deposition (EB-PVD), cathode atomization or cathodic arc evaporation. The process is accomplished in a vacuum chamber. The heat-insulating layer is deposited at a thickness of 1-500 mu m. During the deposition of ceramic vapor, oxygen and inert gas are supplied and the variation of a process parameter comprises the variation of the partial pressure of oxygen and/or the inert gas during the coating process or in the coating chamber. The component to be coated is moved and the variation of the process parameter comprises the variation of the kind of the component movement and/or the speed of movement of the component during the coating process. The component rotates and the variation of the process parameter comprises variation of the number of rotations per minute of the component during the coating process. The variation of the process parameter comprises variation of the deposition rate of the ceramic vapor on the component during the coating process, and variation of the pressure during the coating process or in the coating chamber. An adhesive layer (20) is partly formed between the component surface to be coated and the heat-insulating layer. An intermediate layer of aluminum oxide is formed partly between the component surface to be coated and the adhesive layer. Independent claims are also included for the following: (1) a heat-insulating layer for a component for use in compressor and turbine units; and (2) a component for use in compressor and turbine units.

IPC 8 full level

C23C 14/54 (2006.01)

CPC (source: EP US)

C23C 14/083 (2013.01 - EP US); C23C 14/54 (2013.01 - EP US); C23C 14/542 (2013.01 - EP US); C23C 28/321 (2013.01 - EP US); C23C 28/3215 (2013.01 - EP US); C23C 28/345 (2013.01 - EP US); C23C 28/3455 (2013.01 - EP US); F01D 5/288 (2013.01 - EP US); F05D 2230/313 (2013.01 - EP US); F05D 2230/314 (2013.01 - EP US); F05D 2230/90 (2013.01 - EP US); F05D 2300/611 (2013.01 - EP US); Y10T 428/24174 (2015.01 - EP US)

Citation (search report)

See references of WO 2007118439A1

Designated contracting state (EPC)

DE ES FR GB IT

DOCDB simple family (publication)

DE 102006010860 A1 20070913; CA 2643823 A1 20071025; CN 101400820 A 20090401; EP 2002029 A1 20081217; JP 2009529606 A 20090820; US 2009075024 A1 20090319; WO 2007118439 A1 20071025

DOCDB simple family (application)

DE 102006010860 A 20060309; CA 2643823 A 20070302; CN 200780008381 A 20070302; DE 2007000390 W 20070302; EP 07764320 A 20070302; JP 2008557587 A 20070302; US 28173907 A 20070302