Global Patent Index - EP 2020031 A2

EP 2020031 A2 2009-02-04 - METHOD FOR FORMING HIGH PERFORMANCE 3D FET STRUCTURES USING PREFERENTIAL CRYSTALLOGRAPHIC ETCHING

Title (en)

METHOD FOR FORMING HIGH PERFORMANCE 3D FET STRUCTURES USING PREFERENTIAL CRYSTALLOGRAPHIC ETCHING

Title (de)

VERFAHREN ZUR HERSTELLUNG VON 3D-HOCHLEISTUNGS-FET-STRUKTUREN ANHAND VON BEVORZUGTEM KRISTALLOGRAFISCHEM ÄTZEN

Title (fr)

PROCEDES DE FORMATION DE STRUCTURES FET TRIDIMENSIONNELLES HAUTE PERFORMANCE PAR ATTAQUE CRISTALLOGRAPHIQUE PREFERENTIELLE

Publication

EP 2020031 A2 (EN)

Application

EP 07761242 A

Priority

  • US 2007067360 W
  • US 38069206 A

Abstract (en)

[origin: US2007254412A1] The present invention relates to high performance three-dimensional (3D) field effect transistors (FETs). Specifically, a 3D semiconductor structure having a bottom surface oriented along one of a first set of equivalent crystal planes and multiple additional surfaces oriented along a second, different set of equivalent crystal planes can be used to form a high performance 3D FET with carrier channels oriented along the second, different set of equivalent crystal planes. More importantly, such a 3D semiconductor structure can be readily formed over the same substrate with an additional 3D semiconductor structure having a bottom surface and multiple additional surfaces all oriented along the first set of equivalent crystal planes. The additional 3D semiconductor structure can be used to form an additional 3D FET, which is complementary to the above-described 3D FET and has carrier channels oriented along the first set of equivalent crystal planes.

IPC 8 full level (invention and additional information)

H01L 27/12 (2006.01); H01L 21/336 (2006.01); H01L 21/8238 (2006.01); H01L 27/01 (2006.01); H01L 27/092 (2006.01); H01L 29/00 (2006.01); H01L 29/04 (2006.01); H01L 29/78 (2006.01); H01L 31/036 (2006.01)

CPC (invention and additional information)

H01L 21/823807 (2013.01); H01L 21/823821 (2013.01); H01L 27/0922 (2013.01); H01L 27/1211 (2013.01); H01L 29/04 (2013.01); H01L 29/66795 (2013.01); H01L 29/7853 (2013.01)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA HR MK RS

EPO simple patent family

US 2007254412 A1 20071101; US 7566949 B2 20090728; CN 101427374 A 20090506; CN 101427374 B 20101215; EP 2020031 A2 20090204; EP 2020031 A4 20111102; EP 2020031 B1 20120627; TW 200810107 A 20080216; TW I408803 B 20130911; US 2007298552 A1 20071227; US 2009267196 A1 20091029; US 7569489 B2 20090804; US 7884448 B2 20110208; WO 2007127769 A2 20071108; WO 2007127769 A3 20081002

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2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 27/12 20060101AFI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 27/01 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 29/00 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 29/04 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 31/036 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 21/8238 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 29/78 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 27/092 20060101ALI20120117BHEP

2012-02-22 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 21/336 20060101ALI20120117BHEP

2012-02-22 [RTI1] TITLE (CORRECTION)

- Free text: METHOD FOR FORMING HIGH PERFORMANCE 3D FET STRUCTURES USING PREFERENTIAL CRYSTALLOGRAPHIC ETCHING

2011-11-02 [A4] DESPATCH OF SUPPLEMENTARY SEARCH REPORT

- Effective date: 20111005

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

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2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 27/01 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 29/00 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 29/04 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 31/036 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 21/8238 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 29/78 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

- IPC: H01L 27/092 20060101ALI20110928BHEP

2011-11-02 [RIC1] CLASSIFICATION (CORRECTION)

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