EP 2023378 A1 20090211 - EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
Title (en)
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
Title (de)
BELICHTUNGSAPPARAT UND VERFAHREN ZUR HERSTELLUNG EINER VORRICHTUNG
Title (fr)
APPAREIL D'EXPOSITION ET PROCÉDÉ DE FABRICATION D'UN DISPOSITIF
Publication
Application
Priority
- JP 2007059674 W 20070510
- JP 2006131280 A 20060510
Abstract (en)
An exposure apparatus comprises a first member, which is arranged so as to oppose a surface of a substrate, and between which and the surface of the substrate a liquid immersion space is formed; and a second member, which traps liquid that is present at the surface of the substrate. A distance between the second member and the substrate is smaller than a distance between the first member and the substrate.
IPC 8 full level
G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G03F 7/3092 (2013.01 - KR); G03F 7/70341 (2013.01 - EP KR US); G03F 7/70358 (2013.01 - KR); G03F 7/70916 (2013.01 - KR)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK RS
DOCDB simple family (publication)
US 2007296939 A1 20071227; US 8477283 B2 20130702; CN 101438385 A 20090520; CN 101438385 B 20110216; EP 2023378 A1 20090211; EP 2023378 A4 20111228; EP 2023378 B1 20130313; HK 1127961 A1 20091009; JP 2012191219 A 20121004; JP 5151977 B2 20130227; JP 5545320 B2 20140709; JP WO2007129753 A1 20090917; KR 101486086 B1 20150123; KR 20090029195 A 20090320; TW 200807168 A 20080201; TW I439813 B 20140601; WO 2007129753 A1 20071115
DOCDB simple family (application)
US 79812707 A 20070510; CN 200780016358 A 20070510; EP 07743109 A 20070510; HK 09105499 A 20090619; JP 2007059674 W 20070510; JP 2008514527 A 20070510; JP 2012106207 A 20120507; KR 20087029434 A 20070510; TW 96116574 A 20070510