EP 2024529 A1 20090218 - COLD-PRESSED SPUTTER TARGETS
Title (en)
COLD-PRESSED SPUTTER TARGETS
Title (de)
KALTGEPRESSTE SPUTTERTARGETS
Title (fr)
CIBLES DE PULVÉRISATION CATHODIQUE COMPACTÉES À FROID
Publication
Application
Priority
- EP 2007004754 W 20070530
- DE 102006026005 A 20060601
Abstract (en)
[origin: WO2007137824A1] The invention relates to a sputter target comprising a sputter material that is made of an alloy or a material mixture composed of at least two components which are in a state of thermodynamic disequilibrium. According to the invention, the components are compacted by means of an isostatic or uniaxial cold-pressing process.
IPC 8 full level
C23C 14/34 (2006.01)
CPC (source: EP KR US)
B22F 3/02 (2013.01 - KR); C23C 14/34 (2013.01 - KR); C23C 14/3414 (2013.01 - EP US)
Citation (search report)
See references of WO 2007137824A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK RS
DOCDB simple family (publication)
DE 102006026005 A1 20071206; CN 101460650 A 20090617; EP 2024529 A1 20090218; JP 2009538984 A 20091112; KR 20090031499 A 20090326; RU 2008150855 A 20100720; US 2009277777 A1 20091112; WO 2007137824 A1 20071206; ZA 200810662 B 20091230
DOCDB simple family (application)
DE 102006026005 A 20060601; CN 200780020115 A 20070530; EP 07725645 A 20070530; EP 2007004754 W 20070530; JP 2009512483 A 20070530; KR 20087025817 A 20081022; RU 2008150855 A 20070530; US 29646207 A 20070530; ZA 200810662 A 20081218