Global Patent Index - EP 2024529 A1

EP 2024529 A1 2009-02-18 - COLD-PRESSED SPUTTER TARGETS

Title (en)

COLD-PRESSED SPUTTER TARGETS

Title (de)

KALTGEPRESSTE SPUTTERTARGETS

Title (fr)

CIBLES DE PULVÉRISATION CATHODIQUE COMPACTÉES À FROID

Publication

EP 2024529 A1 (DE)

Application

EP 07725645 A

Priority

  • EP 2007004754 W
  • DE 102006026005 A

Abstract (en)

[origin: WO2007137824A1] The invention relates to a sputter target comprising a sputter material that is made of an alloy or a material mixture composed of at least two components which are in a state of thermodynamic disequilibrium. According to the invention, the components are compacted by means of an isostatic or uniaxial cold-pressing process.

IPC 8 full level (invention and additional information)

C23C 14/34 (2006.01)

CPC (invention and additional information)

C23C 14/3414 (2013.01)

Citation (search report)

See references of WO 2007137824A1

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA HR MK RS

EPO simple patent family

DE 102006026005 A1 20071206; CN 101460650 A 20090617; EP 2024529 A1 20090218; JP 2009538984 A 20091112; KR 20090031499 A 20090326; RU 2008150855 A 20100720; US 2009277777 A1 20091112; WO 2007137824 A1 20071206; ZA 200810662 B 20091230

INPADOC legal status


2012-04-04 [18D] APPLICATION DEEMED TO BE WITHDRAWN

- Effective date: 20110629

2011-12-14 [17Q] FIRST EXAMINATION REPORT

- Effective date: 20110218

2009-02-18 [17P] REQUEST FOR EXAMINATION FILED

- Effective date: 20081009

2009-02-18 [AK] DESIGNATED CONTRACTING STATES:

- Kind Code of Ref Document: A1

- Designated State(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR

2009-02-18 [AX] REQUEST FOR EXTENSION OF THE EUROPEAN PATENT TO:

- Countries: AL BA HR MK RS