Global Patent Index - EP 2032635 A2

EP 2032635 A2 20090311 - COMPOSITIONS AND METHODS FOR POLYMER COMPOSITES

Title (en)

COMPOSITIONS AND METHODS FOR POLYMER COMPOSITES

Title (de)

ZUSAMMENSETZUNGEN UND VERFAHREN FÜR POLYMERVERBINDUNGEN

Title (fr)

COMPOSITIONS ET PROCÉDÉS POUR COMPOSITES POLYMÈRES

Publication

EP 2032635 A2 20090311 (EN)

Application

EP 07840285 A 20070626

Priority

  • US 2007072070 W 20070626
  • US 80582106 P 20060626
  • US 94515007 P 20070620
  • US 76623807 A 20070621

Abstract (en)

[origin: WO2008002888A2] This invention relates to organic salt compositions useful in the preparation of organoclay compositions, polymer-organoclay composite compositions, and methods for the preparation of polymer nanocomposites. In one embodiment, the present invention provides a polymer-organoclay composite composition comprising (a) a polymeric resin; and (b) an organoclay composition comprising alternating inorganic silicate layers and organic layers, said organic layers comprising a quaternary phosphonium cation having structure X wherein Ar<SUP>1</SUP>, Ar<SUP>2</SUP>, and Ar<SUP>3</SUP> are independently C<SUB>2</SUB>-C<SUB>50</SUB> aromatic radicals; Ar<SUP>4</SUP> is a bond or a C<SUB>2</SUB>-C<SUB>50</SUB> aromatic radical; "a" is a number from 1 to about 200; "c" is a number from 0 to 3; R<SUP>1</SUP> is independently at each occurrence a halogen atom, a C<SUB>1</SUB>-C<SUB>20</SUB> aliphatic radical, a C<SUB>5</SUB>-C<SUB>20</SUB> cycloaliphatic radical, or a C<SUB>2</SUB>-C<SUB>20</SUB> aromatic radical; and R<SUP>2</SUP> is a halogen atom, a C<SUB>1</SUB>-C<SUB>20</SUB> aliphatic radical, a C<SUB>5</SUB>-C<SUB>20</SUB> cycloaliphatic radical, a C<SUB>2</SUB>-C<SUB>50</SUB> aromatic radical, or a polymer chain.

IPC 8 full level

C08K 3/34 (2006.01); C08K 5/50 (2006.01); C08K 9/04 (2006.01); C08L 79/08 (2006.01)

CPC (source: EP)

C08K 5/50 (2013.01)

Citation (search report)

See references of WO 2008002888A2

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA HR MK RS

DOCDB simple family (publication)

WO 2008002888 A2 20080103; WO 2008002888 A3 20080522; EP 2032635 A2 20090311

DOCDB simple family (application)

US 2007072070 W 20070626; EP 07840285 A 20070626