EP 2033966 B1 20150729 - Novel photoacid generators, resist compositons, and patterning processes
Title (en)
Novel photoacid generators, resist compositons, and patterning processes
Title (de)
Neue Fotosäuregeneratoren, Harzzusammensetzungen und Strukturierungsverfahren
Title (fr)
Nouveaux générateurs photo-acides, compositions de réserve et procédés de formation
Publication
Application
Priority
JP 2007230363 A 20070905
Abstract (en)
[origin: EP2033966A2] Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ R 1 -COOCH(CF 3 )CF 2 SO 3 - H + €ƒ€ƒ€ƒ€ƒ€ƒ(1a) €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ R 1 -O-COOCH(CF 3 )CF 2 SO 3 - H + €ƒ€ƒ€ƒ€ƒ€ƒ(1c) R 1 is a C 20 -C 50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
IPC 8 full level
C07J 31/00 (2006.01); C07J 41/00 (2006.01); C07J 43/00 (2006.01); G03F 7/00 (2006.01)
CPC (source: EP KR US)
C07J 31/006 (2013.01 - EP US); C07J 41/0055 (2013.01 - EP US); C07J 43/003 (2013.01 - EP US); G03F 7/0045 (2013.01 - EP US); G03F 7/039 (2013.01 - KR); G03F 7/0397 (2013.01 - EP US); G03F 7/2041 (2013.01 - EP US); Y10S 430/114 (2013.01 - EP US)
Designated contracting state (EPC)
DE
DOCDB simple family (publication)
EP 2033966 A2 20090311; EP 2033966 A3 20090527; EP 2033966 B1 20150729; JP 2009080474 A 20090416; JP 5019071 B2 20120905; KR 101182098 B1 20120919; KR 20090025163 A 20090310; TW 200931176 A 20090716; TW I400562 B 20130701; US 2009061358 A1 20090305; US 7670751 B2 20100302
DOCDB simple family (application)
EP 08252959 A 20080905; JP 2008219101 A 20080828; KR 20080087118 A 20080904; TW 97133925 A 20080904; US 20468508 A 20080904