Global Patent Index - EP 2045365 A1

EP 2045365 A1 20090408 - Electrolyte and the method of depositing metal layers especially of iron, cobalt, nikel, copper and zinc

Title (en)

Electrolyte and the method of depositing metal layers especially of iron, cobalt, nikel, copper and zinc

Title (de)

Elektrolyt und Verfahren zur Anbringung von Metallschichten, insbesondere aus Eisen, Kobalt, Nickel, Kupfer und Zink

Title (fr)

Électrolyte et procédé de dépôt de couches métalliques, en particulier de fer, cobalt, nickel, cuivre et zinc

Publication

EP 2045365 A1 20090408 (EN)

Application

EP 08460009 A 20080328

Priority

PL 38211507 A 20070402

Abstract (en)

The electrolyte and the method of depositing metal layers, especially of iron, cobalt, nickel, copper and zinc to be used in electrotechnics and electroplating technology. The method of depositing metal layers, especially of iron, cobalt, nickel, copper and zinc by electrolytic deposition from the electrolyte (4) being a mixture mainly of acetone, hydrochloric acid, positive ions of the metal being deposited, is characterized in that at the initial stage of the process at least one anode (1) is being dissolved in the electrolyte (4) containing, at the initial stage, 90-99 % of acetone, 1-10 % of water and 0.5-3 % of concentrated hydrochloric acid (36 % solution HCl in water). Then the metal layer is deposited on the surface of cathode (5) and the concentration of ions of the metal, being deposited in the electrolyte (4), is set automatically. The electrolyte is characterized in that it contains 90-99 % of acetone, 1-10 % of water and 0.5-3 % of concentrated hydrochloric acid (36 % solution HCl in water).

IPC 8 full level

C25D 3/02 (2006.01); C25D 3/56 (2006.01)

CPC (source: EP)

C25D 3/02 (2013.01); C25D 3/56 (2013.01)

Citation (applicant)

  • US 4701244 A 19871020 - NOBEL FRED I [US], et al
  • DE 3411320 A1 19851010 - HERAEUS GMBH W C [DE]
  • WO 2004031449 A2 20040415 - SUSTECH GMBH & CO KG [DE], et al
  • YU.YA. FIALKOV; A.N. ZHITOMIRSKII; YU.A. TARASENKO: "Fizicheskaya Khimiya Nevodnykh Rastvorov", PHYSICAL CHEMISTRY OF NONAQUEOUS SOLUTIONS, 1973
  • S.G. VUL'FSON; A.N. VERESHCHAGIN; A. E. ARBUZOV: "Electrochemical reduction of rare-earth chelates with certain - diketones", JOURNAL RUSSIAN CHEMICAL BULLETIN, vol. 39, 1990, pages 2481
  • GUAN FU-YU; GAO XIAO-XIA: "Voltammetric study on the reduction of rare earths in acetone", J. CHIN. RE SOC., vol. 8, 1990, pages 166
  • V.N. TITOVA ET AL.: "The influence of solvent on the kinetics of silver electrodeposition", JOURNAL OF ANALYTICAL CHEMISTRY, vol. 381, 1995, pages 227
  • ELECTROCHIMICA ACTA, vol. 49, 2004, pages 321

Citation (search report)

  • [XY] SU 420703 A1 19740325 & DATABASE WPI Week 197507, Derwent World Patents Index; AN 1975-12105W, XP002510210
  • [Y] DE 19840842 A1 20000309 - HENKEL KGAA [DE]
  • [A] DE 1811204 A1 19690821 - COMMISSARIAT ENERGIE ATOMIQUE
  • [DXY] KAMADA K ET AL: "Anodic dissolution of tantalum and niobium in acetone solvent with halogen additives for electrochemical synthesis of Ta2O5 and Nb2O5 thin films", ELECTROCHIMICA ACTA, ELSEVIER SCIENCE PUBLISHERS, BARKING, GB, vol. 49, no. 2, 15 January 2004 (2004-01-15), pages 321 - 327, XP004474653, ISSN: 0013-4686

Designated contracting state (EPC)

DE FR GB

Designated extension state (EPC)

AL BA MK RS

DOCDB simple family (publication)

EP 2045365 A1 20090408; PL 207757 B1 20110131; PL 382115 A1 20081013

DOCDB simple family (application)

EP 08460009 A 20080328; PL 38211507 A 20070402