EP 2055797 A1 20090506 - IRON-BASED ALLOY AND PROCESS FOR PRODUCING THE SAME
Title (en)
IRON-BASED ALLOY AND PROCESS FOR PRODUCING THE SAME
Title (de)
EISENLEGIERUNG UND HERSTELLUNGSVERFAHREN DAFÜR
Title (fr)
ALLIAGE À BASE DE FER ET SON PROCÉDÉ DE FABRICATION
Publication
Application
Priority
- JP 2007066284 W 20070822
- JP 2006226410 A 20060823
Abstract (en)
It is an object of the present invention to provide a ferromagnetic Fe-based alloy having a large reversible strain obtained by application and removal of a magnetic field gradient. The Fe-based alloy contains one or two or more types selected from Al: 0.01 to 11%, Si: 0.01 to 7% and Cr: 0.01 to 26%, or Al: 0.01 to 11%, Si: 0.01 to 7%, Cr: 0.01 to 26% and Ni: 35 to 50%. A twin crystal interface is introduced by working the Fe-based alloy at a working rate: 10% or more. An area ratio of the twin crystal interface to a crystal grain boundary is 0.2 or more. One or two or more types of Ti: 0.01 to 5%, V: 0.01 to 10%, Mn: 0.01 to 5%, Co: 0.01 to 30%, Ni: 0.01 to 10%, Cu: 0.01 to 5%, Zr: 0.01 to 5%, Nb: 0.01 to 5%, Mo: 0.01 to 5%, Hf: 0.01 to 5%, Ta: 0.01 to 5%, W: 0.01 to 5%, B: 0.001 to 1%, C: 0.001 to 1%, P: 0.001 to 1% and S: 0.001 to 1% may be added to the Fe-based alloy if needed.
IPC 8 full level
C22C 38/00 (2006.01); C21D 8/12 (2006.01); C22C 19/03 (2006.01); H01F 1/147 (2006.01)
CPC (source: EP KR US)
C21D 6/00 (2013.01 - EP US); C21D 7/02 (2013.01 - EP US); C21D 8/12 (2013.01 - EP KR US); C21D 10/00 (2013.01 - EP US); C22C 38/00 (2013.01 - EP US); C22C 38/06 (2013.01 - KR); C22C 38/18 (2013.01 - KR); H01F 1/147 (2013.01 - KR); H01F 1/14791 (2013.01 - EP US)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK RS
DOCDB simple family (publication)
EP 2055797 A1 20090506; EP 2055797 A4 20141217; JP 5215855 B2 20130619; JP WO2008023734 A1 20100114; KR 20090038016 A 20090417; US 2009178739 A1 20090716; WO 2008023734 A1 20080228
DOCDB simple family (application)
EP 07792874 A 20070822; JP 2007066284 W 20070822; JP 2008530943 A 20070822; KR 20097003467 A 20090220; US 38997109 A 20090220