EP 2064595 A2 20090603 - OPTICAL ELEMENT AND METHOD
Title (en)
OPTICAL ELEMENT AND METHOD
Title (de)
OPTISCHES ELEMENT UND VERFAHREN
Title (fr)
ÉLÉMENT OPTIQUE ET PROCÉDÉ
Publication
Application
Priority
- EP 2007008266 W 20070921
- DE 102006045075 A 20060921
Abstract (en)
[origin: WO2008034636A2] The invention relates to an optical element (1) for at least partial, localised correction of a wavefront error of an optical system irradiated by an optical beam, comprising a region optically active with regard to the optical beam and electrical conductor tracks (3) in said optically active region, said electrical conductor tracks having, at least partly, a diameter of at most 50 micrometres lateral to the direction of incidence of the optical beam.
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP KR US)
G02B 7/028 (2013.01 - EP KR US); G02B 27/0068 (2013.01 - EP KR US); G03F 7/70266 (2013.01 - EP KR US); G03F 7/70891 (2013.01 - EP KR US)
Citation (search report)
See references of WO 2008034636A2
Citation (examination)
EP 1921505 A1 20080514 - ASML NETHERLANDS BV [NL], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA HR MK RS
DOCDB simple family (publication)
WO 2008034636 A2 20080327; WO 2008034636 A3 20080828; CN 101517489 A 20090826; CN 101517489 B 20120829; DE 102006045075 A1 20080403; EP 2064595 A2 20090603; EP 2650730 A2 20131016; JP 2010504631 A 20100212; JP 5453673 B2 20140326; KR 101493535 B1 20150213; KR 20090058575 A 20090609; US 2009257032 A1 20091015; US 2011080569 A1 20110407; US 8508854 B2 20130813; US 8891172 B2 20141118
DOCDB simple family (application)
EP 2007008266 W 20070921; CN 200780035069 A 20070921; DE 102006045075 A 20060921; EP 07818354 A 20070921; EP 13175621 A 20070921; JP 2009528651 A 20070921; KR 20097008082 A 20070921; US 40201509 A 20090311; US 96655210 A 20101213