Global Patent Index - EP 2080214 A1

EP 2080214 A1 20090722 - DEVICE AND METHOD FOR PRODUCING HIGH POWER MICROWAVE PLASMA

Title (en)

DEVICE AND METHOD FOR PRODUCING HIGH POWER MICROWAVE PLASMA

Title (de)

VORRICHTUNG UND VERFAHREN ZUR ERZEUGUNG VON MIKROWELLENPLASMEN HOHER LEISTUNG

Title (fr)

DISPOSITIF ET PROCEDE POUR PRODUIRE DES PLASMAS DE MICRO-ONDES DE FORTE PUISSANCE

Publication

EP 2080214 A1 20090722 (DE)

Application

EP 07818909 A 20071011

Priority

  • EP 2007008838 W 20071011
  • DE 102006048815 A 20061016

Abstract (en)

[origin: CA2666117A1] The invention relates to a device for producing high power microwave plas ma. Said device comprises at least one microwave supply (1, 2, 4) that is su rrounded by at least one dielectric tube. A dielectric fluid flows through t he area between the microwave supply and the outer dielectric tube, said die lectric fluid having a small dielectric loss factor tan .delta. in the regio n of between 10-2 to 10-7. At least the outer dielectric tube of the above m entioned device is cooled by a fluid.

IPC 8 full level

H01J 37/32 (2006.01)

CPC (source: EP US)

H01J 37/32192 (2013.01 - EP US); H01J 37/3222 (2013.01 - EP US); H01J 37/32522 (2013.01 - EP US)

Citation (search report)

See references of WO 2008046551A1

Citation (examination)

WO 9859359 A1 19981230 - SUNG SPITZL HILDEGARD [DE]

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR

DOCDB simple family (publication)

DE 102006048815 A1 20080417; DE 102006048815 B4 20160317; AU 2007312618 A1 20080424; CA 2666117 A1 20080424; EP 2080214 A1 20090722; US 2010215541 A1 20100826; WO 2008046551 A1 20080424

DOCDB simple family (application)

DE 102006048815 A 20061016; AU 2007312618 A 20071011; CA 2666117 A 20071011; EP 07818909 A 20071011; EP 2007008838 W 20071011; US 31183807 A 20071011