EP 2106457 A1 20091007 - APPARATUS FOR THE PRODUCTION OF A DIRECTIONAL LAYER BY MEANS OF CATHODE SPUTTERING AND USE OF SAME
Title (en)
APPARATUS FOR THE PRODUCTION OF A DIRECTIONAL LAYER BY MEANS OF CATHODE SPUTTERING AND USE OF SAME
Title (de)
VORRICHTUNG ZUR HERSTELLUNG EINER GERICHTETEN SCHICHT MITTELS KATHODENZERSTÄUBUNG UND VERWENDUNG DERSELBEN
Title (fr)
DISPOSITIF DE PRODUCTION D'UNE COUCHE ORIENTÉE PAR PULVÉRISATION CATHODIQUE ET SON UTILISATION
Publication
Application
Priority
- CH 2007000647 W 20071224
- US 88308607 P 20070102
Abstract (en)
[origin: WO2008080244A1] For producing a directional layer with, for example, a constant, labeled direction, such as a soft magnetic layer with a preferred direction of magnetization or a backing layer for such a one by means of cathode sputtering on a substrate surface (4), the coating is produced in such a way that particles originating from a target surface (6) are incident predominantly from directions for which the projection onto the substrate surface (4) lies in a preferred angular sector surrounding the labeled direction. This is achieved, for example, by an arrangement of a collimator (8) with plates (9) which are perpendicular to the substrate surface (4) and parallel to the labeled direction, in front of the substrate surface (4). However, instead of the preceding or in addition thereto, the position or movement of the substrate surface (4) with respect to the target surface (6) can also be adjusted or controlled appropriately.
IPC 8 full level
C23C 14/34 (2006.01); G11B 5/851 (2006.01); H01J 37/34 (2006.01)
CPC (source: EP KR US)
C23C 14/34 (2013.01 - EP KR US); G11B 5/851 (2013.01 - EP KR US); H01J 37/34 (2013.01 - EP KR US); H01J 37/3447 (2013.01 - EP KR US); H01L 21/02631 (2013.01 - KR); H01L 21/20 (2013.01 - KR); H01L 21/67207 (2013.01 - KR)
Citation (search report)
See references of WO 2008080244A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC MT NL PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2008080244 A1 20080710; CN 101627146 A 20100113; CN 102747330 A 20121024; CN 102747330 B 20150128; EP 2106457 A1 20091007; EP 2463401 A1 20120613; EP 2463401 B1 20130724; JP 2010514940 A 20100506; JP 5185285 B2 20130417; KR 101761401 B1 20170725; KR 20090096617 A 20090911; TW 200848533 A 20081216; TW I457453 B 20141021; US 2009134011 A1 20090528; US 9587306 B2 20170307
DOCDB simple family (application)
CH 2007000647 W 20071224; CN 200780049142 A 20071224; CN 201210088822 A 20071224; EP 07845644 A 20071224; EP 12001531 A 20071224; JP 2009544347 A 20071224; KR 20097013819 A 20071224; TW 96151382 A 20071231; US 96830008 A 20080102