EP 2114112 B1 20150923 - Apparatus for industrial plasma processes
Title (en)
Apparatus for industrial plasma processes
Title (de)
Vorrichtung für industrielle Plasmaprozesse
Title (fr)
Appareil pour procédés industriels au plasma
Publication
Application
Priority
EP 08008191 A 20080429
Abstract (en)
[origin: EP2114112A1] The invention relates to an apparatus for industrial plasma processes, like plasma etching, plasma enhanced chemical water deposition and sputtering, for current measurement in radio frequency (RF) low-pressure plasmas, comprising a meter electrode (2) having an inner conductor (3) connected thereto and a dielectric (4) at least on a part of its peripheral surface (5), the meter electrode (2) together with its dielectric (4) being positioned in a flange or recess (10) within a wall (11) of a chamber (12), said apparatus being designed such that the following equation is met: Z 0 = ¼ r µ r ¢ 60 ¢ © ln ¢ D d = 50 or 75 © , wherein Z 0 is the characteristic impedance of the apparatus (1), µ r is the relative permeability and µ r is the dielectric constant of the dielectric (4), respectively, D is the inner diameter of said flange or recess (10) and d is the outer diameter of said inner conductor (3) of the meter electrode (2).
IPC 8 full level
H05H 1/00 (2006.01)
CPC (source: EP KR)
H05H 1/0081 (2013.01 - EP KR); H01J 37/32935 (2013.01 - KR)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 2114112 A1 20091104; EP 2114112 B1 20150923; KR 101048219 B1 20110708; KR 20090114297 A 20091103; TW 200945957 A 20091101; TW I364242 B 20120511
DOCDB simple family (application)
EP 08008191 A 20080429; KR 20080065552 A 20080707; TW 97126206 A 20080711