EP 2119731 A4 20100310 - SILICA SOL HAVING REACTIVE MONOMER DISPERSED THEREIN, METHOD FOR PRODUCING THE SILICA SOL, CURING COMPOSITION, AND CURED ARTICLE PRODUCED FROM THE CURING COMPOSITION
Title (en)
SILICA SOL HAVING REACTIVE MONOMER DISPERSED THEREIN, METHOD FOR PRODUCING THE SILICA SOL, CURING COMPOSITION, AND CURED ARTICLE PRODUCED FROM THE CURING COMPOSITION
Title (de)
KIESELSOL MIT DARIN DISPERGIERTEM REAKTIVEN MONOMER, VERFAHREN ZUR HERSTELLUNG DES KIESELSOLS, HÄRTENDE ZUSAMMENSETZUNG UND AUS DER HÄRTENDEN ZUSAMMENSETZUNG HERGESTELLTER GEHÄRTETER ARTIKEL
Title (fr)
SOL DE SILICE AYANT UN MONOMÈRE RÉACTIF DISPERSÉ EN SON SEIN, PROCÉDÉ DE FABRICATION DU SOL DE SILICE, COMPOSITION DURCISSABLE ET ARTICLE OBTENU À PARTIR DE LA COMPOSITION DURCISSABLE
Publication
Application
Priority
- JP 2008051518 W 20080131
- JP 2007023740 A 20070202
Abstract (en)
[origin: EP2119731A1] [Problem] Colloidal silica particles dispersed in a reactive monomer may cause the polymerization, degradation, or the like of the reactive monomer by an action of the solid acidity of the surfaces of the particles and a monomer may be polymerized during a process for producing a monomer-dispersed silica sol, or a stable silica sol may not be obtained. In addition, a polymer of a resin formed article etc. obtained by curing a monomer-dispersed silica sol may be deteriorated, degraded, or the like with time. Therefore, there are provided a reactive monomer-dispersed silica sol having high stability by reducing the solid acidity of the surfaces of the colloidal silica particles contained in the reactive monomer-dispersed silica sol, and a production method thereof, and a curable composition using the reactive monomer-dispersed silica sol, and a cured article in which the deterioration, the degradation, or the like of the polymer is suppressed. [Means for solving the problem] The present invention provides a reactive monomer-dispersed silica sol containing a colloidal silica particle in which an alkaline earth metal ion is bonded to a surface of the colloidal silica particle.
IPC 8 full level
C08F 2/44 (2006.01); B01J 13/00 (2006.01); C01B 33/146 (2006.01); C08G 59/18 (2006.01); C08G 65/02 (2006.01)
CPC (source: EP KR US)
B01J 13/0008 (2013.01 - EP US); B01J 13/0026 (2013.01 - EP US); B01J 13/0047 (2013.01 - EP US); C01B 33/146 (2013.01 - EP US); C08F 2/40 (2013.01 - EP US); C08F 2/44 (2013.01 - EP KR US); C08G 59/621 (2013.01 - EP US); C08J 3/02 (2013.01 - KR); C08K 3/36 (2013.01 - KR); C08K 9/02 (2013.01 - KR)
Citation (search report)
- [XP] EP 1754685 A2 20070221 - NISSAN CHEMICAL IND LTD [JP]
- [XY] EP 0335195 A2 19891004 - NISSAN CHEMICAL IND LTD [JP]
- [XY] US 3328339 A 19670627 - TIERNEY PAUL A
- [X] EP 1114794 A1 20010711 - NISSAN CHEMICAL IND LTD [JP]
- See references of WO 2008093775A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 2119731 A1 20091118; EP 2119731 A4 20100310; CN 101600738 A 20091209; CN 101600738 B 20121114; JP 5376124 B2 20131225; JP WO2008093775 A1 20100520; KR 101429318 B1 20140811; KR 20090116752 A 20091111; TW 200904751 A 20090201; TW I464116 B 20141211; US 2010029845 A1 20100204; US 2011172331 A1 20110714; US 7999026 B2 20110816; WO 2008093775 A1 20080807
DOCDB simple family (application)
EP 08704265 A 20080131; CN 200880003393 A 20080131; JP 2008051518 W 20080131; JP 2008556172 A 20080131; KR 20097017406 A 20080131; TW 97103980 A 20080201; US 201113064293 A 20110316; US 44932808 A 20080131