EP 2120267 B1 20130807 - Method of manufacturing a semiconductor device
Title (en)
Method of manufacturing a semiconductor device
Title (de)
Verfahren zur Herstellung einer Halbleitervorrichtung
Title (fr)
Procédé de fabrication d'un dispositif semi-conducteur
Publication
Application
Priority
- KR 20080045108 A 20080515
- KR 20080096027 A 20080930
Abstract (en)
[origin: EP2120267A1] Semiconductor devices including at least one thin film transistor (TFT) and methods of manufacturing the semiconductor devices. The semiconductor device may include an oxide TFT having a self-align top gate structure. The oxide TFT may include a first oxide semiconductor layer having a first source region, a first drain region, and a first channel region between the first source region and the first drain region, and a first gate insulating layer and a first gate electrode, which are sequentially stacked on the first channel region. A bottom gate electrode may be further disposed below the first oxide semiconductor layer, and the first oxide semiconductor layer may have a multi-layer structure.
IPC 8 full level
H01L 29/66 (2006.01); H01L 29/786 (2006.01)
CPC (source: EP KR US)
H01L 27/1225 (2013.01 - EP KR US); H01L 27/1251 (2013.01 - EP US); H01L 29/66969 (2013.01 - EP US); H01L 29/78621 (2013.01 - EP KR US); H01L 29/78648 (2013.01 - EP KR US); H01L 29/7869 (2013.01 - EP KR US); H01L 29/78696 (2013.01 - EP US)
Citation (examination)
- WO 2005074038 A1 20050811 - HEWLETT PACKARD DEVELOPMENT CO [US], et al
- WO 2007119386 A1 20071025 - CANON KK [JP], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 2120267 A1 20091118; EP 2120267 B1 20130807; CN 101582453 A 20091118; CN 101582453 B 20140903; EP 2408011 A2 20120118; EP 2408011 A3 20120222; EP 2927965 A1 20151007; EP 2927965 B1 20170712; JP 2009278115 A 20091126; JP 5670028 B2 20150218; KR 101496148 B1 20150227; KR 20090119666 A 20091119; US 2009283763 A1 20091119; US 8384076 B2 20130226
DOCDB simple family (application)
EP 09160223 A 20090514; CN 200910140975 A 20090515; EP 11183826 A 20090514; EP 15164604 A 20090514; JP 2009119199 A 20090515; KR 20080096027 A 20080930; US 45353009 A 20090514