Global Patent Index - EP 2126629 A4

EP 2126629 A4 20111221 - DEVICE AND METHOD FOR MANUFACTURING A PARTICULATE FILTER WITH REGULARLY SPACED MICROPORES

Title (en)

DEVICE AND METHOD FOR MANUFACTURING A PARTICULATE FILTER WITH REGULARLY SPACED MICROPORES

Title (de)

VORRICHTUNG UND VERFAHREN ZUR HERSTELLUNG EINES PARTIKELFILTERS MIT GLEICHMÄSSIG VERTEILTEN MIKROPOREN

Title (fr)

DISPOSITIF ET PROCÉDÉ DE FABRICATION D'UN FILTRE À PARTICULES COMPORTANT DES MICROPORES ESPACÉS RÉGULIÈREMENT

Publication

EP 2126629 A4 20111221 (EN)

Application

EP 08743851 A 20080313

Priority

  • US 2008056848 W 20080313
  • US 89459307 P 20070313
  • US 85661507 A 20070917

Abstract (en)

[origin: WO2008112888A1] Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

IPC 8 full level

G03F 1/00 (2006.01); B01D 67/00 (2006.01); B01D 71/48 (2006.01)

CPC (source: EP US)

B01D 67/0032 (2013.01 - EP); B01D 67/0034 (2013.01 - EP); B01D 71/48 (2013.01 - EP US); G03F 7/12 (2013.01 - EP); G03F 7/2037 (2013.01 - EP); H01J 37/3056 (2013.01 - EP); B01D 2323/42 (2013.01 - EP); B01D 2325/028 (2013.01 - EP); H01J 2237/3174 (2013.01 - EP); H01J 2237/31755 (2013.01 - EP); H01J 2237/31788 (2013.01 - EP)

Citation (search report)

  • [XDI] HAN K ET AL: "Fabrication and characterization of polymeric microfiltration membranes using aperture array lithography", JOURNAL OF MEMBRANE SCIENCE, ELSEVIER SCIENTIFIC PUBL.COMPANY. AMSTERDAM, NL, vol. 249, no. 1-2, 1 March 2005 (2005-03-01), pages 193 - 206, XP004731307, ISSN: 0376-7388, DOI: 10.1016/J.MEMSCI.2004.09.044
  • [X] HUDEK P ET AL: "Directly sputtered stress-compensated carbon protective layer for silicon stencil masks*", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B: MICROELECTRONICSPROCESSING AND PHENOMENA, AMERICAN VACUUM SOCIETY, NEW YORK, NY, US, vol. 17, no. 6, 1 November 1999 (1999-11-01), pages 3127 - 3131, XP012007889, ISSN: 0734-211X, DOI: 10.1116/1.590966
  • See also references of WO 2008112888A1

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

DOCDB simple family (publication)

WO 2008112888 A1 20080918; EP 2126629 A1 20091202; EP 2126629 A4 20111221; JP 2010521291 A 20100624

DOCDB simple family (application)

US 2008056848 W 20080313; EP 08743851 A 20080313; JP 2009553778 A 20080313