EP 2128701 A1 20091202 - Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
Title (en)
Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process
Title (de)
Verfahren zur Bestimmung von Defekten in einem Substrat und Vorrichtung zur Belichtung eines Substrats in einem lithographischen Verfahren
Title (fr)
Méthode de détermination de défauts dans un substrat et appareil pour exposer un substrat dans un procédé de lithographie
Publication
Application
Priority
US 12901608 P 20080530
Abstract (en)
Method of determining defects in a substrate (W), the method comprising: scanning a scan range of the substrate (W) with a sensor (LS), the sensor (LS) projecting a beam of radiation on the substrate (W); measuring the fraction of the intensity of the radiation reflected from different substrate areas along the scan range; determining the variations of the measured fraction across the scan range; determining from the variations whether any defects are present in the substrate (W).
IPC 8 full level
G03F 7/20 (2006.01); G01N 21/00 (2006.01); G01B 11/00 (2006.01)
CPC (source: EP KR US)
G01N 21/9501 (2013.01 - EP KR US); G03F 7/70525 (2013.01 - EP KR US); G03F 7/70533 (2013.01 - EP KR US); G03F 7/70641 (2013.01 - EP KR US); G03F 7/7065 (2013.01 - EP KR US); G03F 7/7085 (2013.01 - EP KR US); G03F 7/70916 (2013.01 - EP KR US); H01L 21/67288 (2013.01 - KR)
Citation (applicant)
- US 2004189964 A1 20040930 - NIJMEIJER GERRIT JOHANNES [NL], et al
- US 2007153273 A1 20070705 - MEEKS STEVEN W [US]
- US 2007179740 A1 20070802 - BELL ERNEST [US], et al
Citation (search report)
- [XA] US 2004189964 A1 20040930 - NIJMEIJER GERRIT JOHANNES [NL], et al
- [XA] US 2007153273 A1 20070705 - MEEKS STEVEN W [US]
- [XA] US 2007179740 A1 20070802 - BELL ERNEST [US], et al
- [A] EP 1457828 A2 20040915 - ASML NETHERLANDS BV [NL]
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
EP 2128701 A1 20091202; CN 101592872 A 20091202; JP 2009290210 A 20091210; KR 101149842 B1 20120524; KR 20090125010 A 20091203; SG 157313 A1 20091229; TW 200951430 A 20091216; TW I414783 B 20131111; US 2009296090 A1 20091203; US 8345231 B2 20130101
DOCDB simple family (application)
EP 09160128 A 20090513; CN 200910142608 A 20090531; JP 2009123725 A 20090522; KR 20090047698 A 20090529; SG 2009033317 A 20090514; TW 98117322 A 20090525; US 47084809 A 20090522