EP 2132764 A2 20091216 - ION SOURCES AND METHODS OF OPERATING AN ELECTROMAGNET OF AN ION SOURCE
Title (en)
ION SOURCES AND METHODS OF OPERATING AN ELECTROMAGNET OF AN ION SOURCE
Title (de)
IONENQUELLEN UND VERFAHREN FÜR DEN BETRIEB EINES ELEKTROMAGNETS EINER IONENQUELLE
Title (fr)
SOURCES IONIQUES ET PROCÉDÉS D'UTILISATION D'UN ÉLECTROAIMANT D'UNE SOURCE IONIQUE
Publication
Application
Priority
- US 2008055016 W 20080226
- US 67897907 A 20070226
- US 89166907 P 20070226
Abstract (en)
[origin: WO2008106448A2] Ion sources and methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The ion source (10) includes a discharge chamber (16) and an electromagnet (42; 42a-d) adapted to generate a magnetic field (75) for changing a plasma density distribution inside the discharge chamber (16). The methods may include generating plasma (17) in the discharge space (24), generating and shaping a magnetic field (75) in the discharge space (24) by applying a current to an electromagnet (42; 42a-d) that is effective to define the plasma density distribution, extracting an ion beam (15) from the plasma (17), measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet (42; 42a-d) may be adjusted to modify magnetic field (75) the magnetic field in the discharge space and, thereby, alter the plasma density distribution.
IPC 8 full level
H01J 37/08 (2006.01); C23C 14/35 (2006.01); H01J 27/16 (2006.01); H01J 27/18 (2006.01); H01J 37/32 (2006.01)
CPC (source: EP)
H01J 27/18 (2013.01); H01J 37/08 (2013.01); H01J 37/302 (2013.01); H01J 37/305 (2013.01); H01J 37/32082 (2013.01); H01J 2237/0656 (2013.01); H01J 2237/24542 (2013.01)
Citation (search report)
See references of WO 2008106448A2
Citation (examination)
- JP H04147969 A 19920521 - HITACHI LTD
- US 4862032 A 19890829 - KAUFMAN HAROLD R [US], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2008106448 A2 20080904; WO 2008106448 A3 20090129; CN 101681781 A 20100324; CN 101681781 B 20130403; EP 2132764 A2 20091216; EP 2587516 A1 20130501; JP 2010519710 A 20100603; JP 5091258 B2 20121205
DOCDB simple family (application)
US 2008055016 W 20080226; CN 200880013320 A 20080226; EP 08730756 A 20080226; EP 12188592 A 20080226; JP 2009551065 A 20080226