Global Patent Index - EP 2150634 A1

EP 2150634 A1 20100210 - METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION

Title (en)

METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION

Title (de)

VERFAHREN ZUR STEUERUNG DER PROZESSGASKONZENTRATION

Title (fr)

PROCÉDÉ DE RÉGLAGE DE LA CONCENTRATION EN GAZ DE TRAITEMENT

Publication

EP 2150634 A1 20100210 (DE)

Application

EP 08750339 A 20080519

Priority

  • EP 2008056104 W 20080519
  • DE 102007024266 A 20070523

Abstract (en)

[origin: WO2008142043A1] The invention relates to a method for controlling the process gas concentration for the treatment of substrates in a process chamber, wherein a liquid is evaporated in a bubbler by means of the bubbles of a carrier gas that are guided through. The aim of the invention is to create a method for controlling the process gas concentration that is easy to implement. Said aim is achieved by the production of a predetermined constant interior pressure within the bubbler, and subsequent introduction of a carrier gas into the bubbler while at the same time controlling the temperature of the medium to be evaporated within the bubbler in order to set a predetermined vapor pressure.

IPC 8 full level

C23C 16/448 (2006.01); B23K 1/20 (2006.01); C23C 16/52 (2006.01)

CPC (source: EP KR US)

C23C 16/448 (2013.01 - KR); C23C 16/4482 (2013.01 - EP US); C23C 16/52 (2013.01 - EP KR US)

Citation (search report)

See references of WO 2008142043A1

Citation (examination)

DE 60021955 T2 20060614 - SHINETSU CHEMICAL CO [JP]

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA MK RS

DOCDB simple family (publication)

DE 102007024266 A1 20081127; CN 101688304 A 20100331; EP 2150634 A1 20100210; JP 2010527794 A 20100819; KR 20100030620 A 20100318; TW 200902132 A 20090116; TW I372650 B 20120921; US 2010215853 A1 20100826; WO 2008142043 A1 20081127

DOCDB simple family (application)

DE 102007024266 A 20070523; CN 200880019517 A 20080519; EP 08750339 A 20080519; EP 2008056104 W 20080519; JP 2010508817 A 20080519; KR 20097026555 A 20080519; TW 97117912 A 20080515; US 60131108 A 20080519