Global Patent Index - EP 2152825 A2

EP 2152825 A2 20100217 - FILM-FORMING MATERIAL, CROSSLINKERS AND COATING COMPOSITIONS CONTAINING SILANE, METHODS FOR PRODUCING A COATING COMPOSITION AND A COATED SUBSTRATE

Title (en)

FILM-FORMING MATERIAL, CROSSLINKERS AND COATING COMPOSITIONS CONTAINING SILANE, METHODS FOR PRODUCING A COATING COMPOSITION AND A COATED SUBSTRATE

Title (de)

FOLIENBILDENDES MATERIAL, VERNETZER UND BESCHICHTUNGSZUSAMMENSETZUNGEN MIT SILAN, VERFAHREN ZUR HERSTELLUNG EINER BESCHICHTUNGSZUSAMMENSETZUNG UND BESCHICHTETES SUBSTRAT

Title (fr)

MATÉRIAU FILMOGÈNE, AGENTS DE RÉTICULATION ET COMPOSITIONS DE REVÊTEMENT CONTENANT DU SILANE, PROCÉDÉS PERMETTANT DE PRODUIRE UNE COMPOSITION DE REVÊTEMENT ET SUBSTRAT MUNI D'UN REVÊTEMENT

Publication

EP 2152825 A2 20100217 (EN)

Application

EP 08836586 A 20080218

Priority

  • US 2008054198 W 20080218
  • US 68526107 A 20070313
  • US 68526407 A 20070313
  • US 68527207 A 20070313

Abstract (en)

[origin: WO2009045558A2] Film-forming materials include resins and/or crosslinkers having a -Si(OR)3 group. Film-forming resins can include epoxy, acrylic, polyurethane, polycarbonate, polysiloxane, polyvinyl, polyether, aminoplast, and polyester resins. A process to produce a film-forming resin includes reacting various polymers to incorporate a pendent group comprising a -Si(OR)3 group. Crosslinkers for polymerizing a film-forming material include at least two functional groups reactive with a film-forming material and at least one pendent group comprising a -Si(OR)3 group. Functional groups reactive with a film-forming material include isocyanate, blocked isocyanate, uretdione, epoxide, hydroxyl, carboxyl, ester, ether, carbamate, aminoalkanol, aminoalkylether, amide, or amine groups. Film-forming resins and/or crosslinkers having a -Si(OR)3 group can be used in methods of producing coating compositions. Coating compositions can be used to coat a substrate, such as a metal substrate, by electrodeposition. Applied coatings containing the film-forming resins can be cured to form crosslinked films on substrates.

IPC 8 full level

C09D 201/10 (2006.01)

CPC (source: EP KR)

C08G 18/289 (2013.01 - EP); C09D 175/04 (2013.01 - EP); C09D 201/10 (2013.01 - KR)

Citation (search report)

See references of WO 2009045558A2

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA MK RS

DOCDB simple family (publication)

WO 2009045558 A2 20090409; WO 2009045558 A3 20090528; EP 2152825 A2 20100217; JP 2010521552 A 20100624; KR 20100015534 A 20100212

DOCDB simple family (application)

US 2008054198 W 20080218; EP 08836586 A 20080218; JP 2009553669 A 20080218; KR 20097021338 A 20080218