EP 2164705 B1 20171227 - A METHOD FOR MANUFACTURING A SEAMLESS CONTINUOUS MATERIAL FOR SECURITY ELEMENTS, A SEAMLESS CONTINUOUS MATERIAL FOR SECURITY ELEMENTS AND METHODS FOR MANUFACTURING IMPRESSION OR EMBOSSING CYLINDERS
Title (en)
A METHOD FOR MANUFACTURING A SEAMLESS CONTINUOUS MATERIAL FOR SECURITY ELEMENTS, A SEAMLESS CONTINUOUS MATERIAL FOR SECURITY ELEMENTS AND METHODS FOR MANUFACTURING IMPRESSION OR EMBOSSING CYLINDERS
Title (de)
VERFAHREN ZUR HERSTELLUNG EINES NAHTLOSEN ENDLOSMATERIALS FÜR SICHERHEITSELEMENTE, EIN NAHTLOSES ENDLOSMATERIAL FÜR SICHERHEITSELEMENTE UND VERFAHREN ZUR HERSTELLUNG VON DRUCK- ODER PRÄGEZYLINDERN
Title (fr)
UN PROCÉDÉ POUR LA FABRICATION D'UN MATÉRIAU CONTINU SANS COUTURE POUR LES ÉLÉMENTS DE SÉCURITÉ, UN MATÉRIAU CONTINU SANS COUTURE POUR LES ÉLÉMENTS DE SÉCURITÉ AINSI QUE DES PROCÉDÉS POUR LA FABRICATION DE CYLINDRES D'IMPRESSION OU D'ESTAMPAGE
Publication
Application
Priority
- EP 2008004190 W 20080527
- DE 102007025667 A 20070601
Abstract (en)
[origin: WO2008145333A2] The invention relates to a method for producing continuous material for security elements comprising micro-optical moire magnification arrays that have a motif screen composed of a plurality of micro-motif elements as well as a focusing element screen composed of a plurality of micro-focusing elements for moire-magnified viewing of the micro-motif elements. In said method, a) a motif screen composed of an at least locally periodic array of micro-motif elements is provided in the form of a first one-dimensional or two-dimensional grid, b) a focusing element screen composed of an at least locally periodic array of a plurality of micro-focusing elements is provided in the form of a second one-dimensional or two-dimensional grid, c) a pattern repeat of the motif screen and/or the focusing element screen is predefined on the continuous material, d) it is verified whether the grid of the motif screen and/or the grid of the focusing element screen is/are periodically repeated in the predefined pattern repeat, and if that is not the case, a linear transformation is determined which distorts the first and/or the second grid in such a way that the grid is periodically repeated in the predefined pattern repeat, and e) the motif screen or the focusing element screen is replaced by the motif screen or focusing element screen distorted by the determined linear transformation.
IPC 8 full level
B41F 11/02 (2006.01); B41F 19/06 (2006.01); B41M 3/14 (2006.01); B42D 25/342 (2014.01); B42D 25/355 (2014.01)
CPC (source: EP US)
B41F 19/062 (2013.01 - EP US); B42D 25/342 (2014.10 - EP US); B42D 25/355 (2014.10 - US); D05B 93/00 (2013.01 - US); B41M 3/14 (2013.01 - EP US); B42D 25/324 (2014.10 - EP US); B42D 2035/44 (2022.01 - EP); Y10T 83/0538 (2015.04 - EP US); Y10T 428/24479 (2015.01 - EP US); Y10T 428/24802 (2015.01 - EP US)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
DE 102007025667 A1 20081204; CN 101687414 A 20100331; CN 101687414 B 20120125; EP 2164705 A2 20100324; EP 2164705 B1 20171227; US 2010187806 A1 20100729; US 8783728 B2 20140722; WO 2008145333 A2 20081204; WO 2008145333 A3 20090326
DOCDB simple family (application)
DE 102007025667 A 20070601; CN 200880017699 A 20080527; EP 08758776 A 20080527; EP 2008004190 W 20080527; US 60159008 A 20080527