EP 2164813 A2 20100324 - METHOD FOR THE WET-CHEMICAL ETCHING OF TIO2 THIN-FILMS AND TIO2 PARTICLES AND ETCHING REAGENT
Title (en)
METHOD FOR THE WET-CHEMICAL ETCHING OF TIO2 THIN-FILMS AND TIO2 PARTICLES AND ETCHING REAGENT
Title (de)
VERFAHREN ZUM NASSCHEMISCHEN ÄTZEN VON TIO2-DÜNNSCHICHTEN UND TIO2-PARTIKELN SOWIE ÄTZMITTEL
Title (fr)
PROCÉDÉ DE GRAVURE CHIMIQUE EN MILIEU HUMIDE SUR COUCHES MINCES DE TiO2 ET SUR PARTICULES DE TiO2, ET AGENT DE GRAVURE CHIMIQUE
Publication
Application
Priority
- DE 2008000875 W 20080523
- DE 102007025136 A 20070530
Abstract (en)
[origin: WO2008145098A2] The invention relates to a method and an etching reagent for the wet-chemical etching of TiO2 thin-films and TiO2particles that permits a defined removal of the TiO2thin-film and a reduction of the particle size. The method comprises the steps: production of an etching reagent with a pH value greater than 13, said reagent containing a base with a concentration of > 0.1 mol, selected from the bases NH4OH, NaOH, KOH or mixtures of the same and H2O2 with a smaller concentration than that of the base; setting of a temperature that is equal to or greater than the ambient temperature; immersion of the TiO2 thin-films and TiO2 particles in the etching reagent and steeping of the layers and particles in accordance with the temperature and composition of the etching reagent; removal of the etched TiO2 thin-films and particles, said films and particles are then rinsed with distilled water and dried. To maintain the initial composition of the etching reagent, H2O2 is added during the etching process.
IPC 8 full level
C03C 17/245 (2006.01); C03C 17/25 (2006.01); C09K 13/02 (2006.01)
CPC (source: EP)
C01G 23/047 (2013.01); C03C 15/00 (2013.01); C03C 17/2456 (2013.01); C03C 17/256 (2013.01); C09K 13/02 (2013.01); H01G 9/2031 (2013.01); C01P 2004/03 (2013.01); C03C 2217/212 (2013.01); C03C 2218/33 (2013.01); Y02E 10/542 (2013.01)
Citation (search report)
See references of WO 2008145098A2
Citation (examination)
- "Gmelins Handbuch der Anorganischen Chemie, 8the Edition, vol. 41, Titan", 1951, VERLAG CHEMIE, XP007913637
- ANONYMOUS: "Concentration", 28 May 2007 (2007-05-28), XP007920243, Retrieved from the Internet <URL:http://en.wikipedia.org/w/index.php?oldid=134156112> [retrieved on 20120214]
- ANONYMOUS: "Avogadro constant", 22 May 2007 (2007-05-22), XP007920244, Retrieved from the Internet <URL:http://en.wikipedia.org/w/index.php?oldid=132665474> [retrieved on 20120214]
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA MK RS
DOCDB simple family (publication)
WO 2008145098 A2 20081204; WO 2008145098 A3 20090212; DE 102007025136 A1 20081211; EP 2164813 A2 20100324
DOCDB simple family (application)
DE 2008000875 W 20080523; DE 102007025136 A 20070530; EP 08758115 A 20080523