EP 2165312 A1 20100324 - METHOD FOR SEMICONDUCTOR SUBSTRATE INSPECTION
Title (en)
METHOD FOR SEMICONDUCTOR SUBSTRATE INSPECTION
Title (de)
VERFAHREN ZUR HALBLEITERSUBSTRATUNTERSUCHUNG
Title (fr)
PROCÉDÉ POUR UNE INSPECTION D'UN SUBSTRAT À SEMI-CONDUCTEUR
Publication
Application
Priority
- EP 2008057169 W 20080609
- EP 07011460 A 20070612
- EP 08760733 A 20080609
Abstract (en)
[origin: WO2008152020A1] A method is provided for detecting anomalies in a semiconductor substrate comprising the steps of: -providing a semiconductor substrate -capturing an inspection image of the substrate -generating a reference image of the substrate -subtracting the reference image from the inspection image, thereby generating a resulting image -examining the resulting image characterized in that the reference image is generated from the inspection image.
IPC 8 full level
G01N 21/95 (2006.01); G06T 7/00 (2006.01)
CPC (source: EP)
G01N 21/9501 (2013.01); G06T 7/001 (2013.01); G01N 2021/8896 (2013.01); G06T 2207/20064 (2013.01); G06T 2207/30148 (2013.01)
Citation (search report)
See references of WO 2008152020A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA MK RS
DOCDB simple family (publication)
DOCDB simple family (application)
EP 2008057169 W 20080609; EP 08760733 A 20080609