Global Patent Index - EP 2165581 A1

EP 2165581 A1 20100324 - COMPOSITIONS AND METHODS FOR CREATING ELECTRONIC CIRCUITRY

Title (en)

COMPOSITIONS AND METHODS FOR CREATING ELECTRONIC CIRCUITRY

Title (de)

ZUSAMMENSETZUNGEN UND VERFAHREN ZUR HERSTELLUNG EINES ELEKTRISCHEN SCHALTKREISES

Title (fr)

COMPOSITIONS ET PROCÉDÉS POUR LA CRÉATION DE CIRCUITS ÉLECTRONIQUES

Publication

EP 2165581 A1 20100324 (EN)

Application

EP 08780067 A 20080709

Priority

  • US 2008008428 W 20080709
  • US 95874407 P 20070709

Abstract (en)

[origin: WO2009009070A1] The present invention is directed to non- lithographic patterning by laser (or similar-type energy beam) ablation, where the ablation system ultimately results in circuitry features that are relative free from debris induced over-plating defects (debris relating to the ablation process) and fully additive plating induced over-plating defects. Compositions of the invention include a circuit board. precursor having an insulating substrate and a cover layer. The insulating substrate is made from a dielectric material and also a metal oxide activatable filler. The cover layer can be sacrificial or non-sacrificial and is used to remediate unwanted debris arising from the ablation process. The cover layer composition comprises 80 to 100 weight % of a soluble polymeric matrix material.

IPC 8 full level

H05K 1/03 (2006.01); H05K 3/18 (2006.01)

CPC (source: EP)

H05K 1/0373 (2013.01); H05K 3/184 (2013.01); H05K 3/185 (2013.01); H05K 3/0032 (2013.01); H05K 3/28 (2013.01); H05K 2201/0209 (2013.01); H05K 2201/0236 (2013.01); H05K 2203/107 (2013.01)

Citation (search report)

See references of WO 2009009070A1

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA MK RS

DOCDB simple family (publication)

WO 2009009070 A1 20090115; EP 2165581 A1 20100324; EP 2165581 B1 20120822; JP 2010535645 A 20101125; JP 5292398 B2 20130918; TW 200920593 A 20090516; TW I381940 B 20130111

DOCDB simple family (application)

US 2008008428 W 20080709; EP 08780067 A 20080709; JP 2010516046 A 20080709; TW 97125991 A 20080709