EP 2177312 A1 20100421 - A chemical mechanical polishing pad having window with integral identification feature
Title (en)
A chemical mechanical polishing pad having window with integral identification feature
Title (de)
Chemisch-mechanisches Polierpad mit Fenster mit integrierter Identifizierungsfunktion
Title (fr)
Tampon à polir mécanique et chimique ayant une fenêtre avec fonction d'identification intégrale
Publication
Application
Priority
- US 25282008 A 20081016
- US 39753509 A 20090304
Abstract (en)
Chemical mechanical polishing pads having a window (16,20,120) with an integral identification feature (11,30,130), wherein the window has a polishing face and a nonpolishing face, wherein the integral identification feature is observable through the window, and wherein the integral identification feature identifies the chemical mechanical polishing pad as a type of chemical mechanical polishing pad selected from a plurality of types of chemical mechanical polishing pads. Also provided is a method of making such chemical mechanical polishing pads and for using them to polish a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate.
IPC 8 full level
B24B 7/22 (2006.01); B24B 37/04 (2006.01); B24D 13/14 (2006.01)
CPC (source: EP)
B24B 7/228 (2013.01); B24B 37/04 (2013.01); B24D 13/14 (2013.01)
Citation (applicant)
- US 5533923 A 19960709 - SHAMOUILIAN SHAMOUIL [US], et al
- US 5584146 A 19961217 - SHAMOUILLAN SHAMOUIL [US], et al
Citation (search report)
- [DA] US 5533923 A 19960709 - SHAMOUILIAN SHAMOUIL [US], et al
- [A] US 2007010169 A1 20070111 - SWISHER ROBERT G [US], et al
Designated contracting state (EPC)
DE FR
Designated extension state (EPC)
AL BA RS
DOCDB simple family (publication)
EP 2177312 A1 20100421; EP 2177312 B1 20110427; DE 602009001168 D1 20110609
DOCDB simple family (application)
EP 09155069 A 20090313; DE 602009001168 T 20090313