EP 2188611 A1 20100526 - APPARATUS AND METHOD FOR MONITORING DEPOSITION IN SYSTEMS CONTAINING PROCESS LIQUIDS
Title (en)
APPARATUS AND METHOD FOR MONITORING DEPOSITION IN SYSTEMS CONTAINING PROCESS LIQUIDS
Title (de)
VORRICHTUNG UND VERFAHREN ZUR ÜBERWACHUNG VON ABLAGERUNGEN IN SYSTEMEN MIT PROZESSFLÜSSIGKEITEN
Title (fr)
APPAREIL ET PROCÉDÉ DE CONTRÔLE DE DÉPÔT DANS DES SYSTÈMES CONTENANT DES LIQUIDES DE TRAITEMENT
Publication
Application
Priority
- FI 2008050511 W 20080915
- FI 20070706 A 20070914
Abstract (en)
[origin: WO2009034236A1] The present invention relates to an apparatus for monitoring deposition in systems containing process liquids, e.g. process waters. The invention also relates to the use of said apparatus and a method for monitoring deposition on surfaces. The invention also relates to feeding of deposition inhibitors. Said apparatus comprises an overflow holder (2) for gathering liquid (L) from the liquid process, a discharge unit (3) for leading liquid (L) from said overflow holder (2), a flow meter unit (4) connected to said discharge unit (3) for measuring rate of flow for monitoring deposition on surfaces.
IPC 8 full level
G01N 11/04 (2006.01); G01N 15/00 (2006.01)
CPC (source: EP)
C02F 1/008 (2013.01); C02F 5/00 (2013.01); C02F 2103/023 (2013.01); C02F 2209/40 (2013.01)
Citation (search report)
See references of WO 2009034236A1
Citation (examination)
- US 3253740 A 19660531 - KEYES MARION A
- WO 9215866 A1 19920917 - EDEN ROBERT DAVID [GB]
- GB 2326113 A 19981216 - BAKER HUGHES LTD [GB]
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA MK RS
DOCDB simple family (publication)
WO 2009034236 A1 20090319; CN 101802587 A 20100811; EP 2188611 A1 20100526; FI 20070706 A0 20070914
DOCDB simple family (application)
FI 2008050511 W 20080915; CN 200880106730 A 20080915; EP 08805434 A 20080915; FI 20070706 A 20070914