EP 2191699 B1 20151111 - HIGH-VOLTAGE INSULATOR ARRANGEMENT, AND ION ACCELERATOR ARRANGEMENT COMPRISING SUCH A HIGH-VOLTAGE INSULATOR ARRANGEMENT
Title (en)
HIGH-VOLTAGE INSULATOR ARRANGEMENT, AND ION ACCELERATOR ARRANGEMENT COMPRISING SUCH A HIGH-VOLTAGE INSULATOR ARRANGEMENT
Title (de)
HOCHSPANNUNGSISOLATORANORDNUNG UND IONENBESCHLEUNIGERANORDNUNG MIT EINER SOLCHEN HOCHSPANNUNGSISOLATORANORDNUNG
Title (fr)
DISPOSITIF D'ISOLATION HAUTE TENSION ET DISPOSITIF ACCÉLÉRATEUR D'IONS COMPRENANT UN TEL DISPOSITIF D'ISOLATION HAUTE TENSION
Publication
Application
Priority
- EP 2008062142 W 20080912
- DE 102007044070 A 20070914
Abstract (en)
[origin: WO2009037195A1] The invention relates to an ion accelerator arrangement comprising an electrostatic acceleration field between a cathode to which a frame potential is applied and an anode to which a high-voltage potential is applied. Said ion accelerator arrangement further comprises a gas supply system into which a gas-permeable, open porous insulator member is introduced. Also described is a high-voltage insulator arrangement that comprises such an insulator member and is suitable, inter alia, for such an ion accelerator arrangement and for the corona-resistant insulation of other components to which a high voltage is applied.
IPC 8 full level
H05H 7/00 (2006.01); B03C 3/38 (2006.01); H01J 27/00 (2006.01); H01R 13/53 (2006.01)
CPC (source: EP US)
B03C 3/383 (2013.01 - EP US); F03H 1/0012 (2013.01 - EP); H01J 27/00 (2013.01 - US); H01R 13/53 (2013.01 - EP US); H05H 7/00 (2013.01 - EP US); H01R 4/70 (2013.01 - EP US)
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2009037195 A1 20090326; CN 101855948 A 20101006; CN 101855948 B 20121121; DE 102007044070 A1 20090402; EP 2191699 A1 20100602; EP 2191699 B1 20151111; JP 2010539373 A 20101216; JP 5449166 B2 20140319; KR 101468118 B1 20141203; KR 20100098594 A 20100908; RU 2010114721 A 20111020; RU 2481753 C2 20130510; US 2011089836 A1 20110421; US 8587202 B2 20131119
DOCDB simple family (application)
EP 2008062142 W 20080912; CN 200880115840 A 20080912; DE 102007044070 A 20070914; EP 08804107 A 20080912; JP 2010524501 A 20080912; KR 20107008164 A 20080912; RU 2010114721 A 20080912; US 73362808 A 20080912