EP 2195472 A1 20100616 - DEVICE FOR VERY HIGH FREQUENCY PLASMA ASSISTED CVD UNDER ATMOSPHERIC PRESSURE, AND APPLICATIONS THEREOF
Title (en)
DEVICE FOR VERY HIGH FREQUENCY PLASMA ASSISTED CVD UNDER ATMOSPHERIC PRESSURE, AND APPLICATIONS THEREOF
Title (de)
VORRICHTUNG ZUR PLASMAUNTERSTÜTZTEN CHEMISCHEN GASPHASENABSCHEIDUNG MIT HOHER FREQUENZ UNTER ATMOSPHÄRISCHEM DRUCK SOWIE ANWENDUNGEN DAFÜR
Title (fr)
DISPOSITIF ET PROCEDE DE DEPOT CVD ASSISTE PAR PLASMA TRES HAUTE FREQUENCE A LA PRESSION ATMOSPHERIQUE, ET SES APPLICATIONS
Publication
Application
Priority
- FR 2008051660 W 20080916
- FR 0757720 A 20070920
Abstract (en)
[origin: WO2009047442A1] The invention relates to a method for CVD on a substrate under atmospheric pressure, characterised in that it is assisted by a very-high-frequency plasma generated by a field applicator with an elongated conductor of the micro-ribbon or hollow conducting line type. The invention also relates to the use thereof for applying an electrically conductive inorganic layer on elements of vehicle bodywork, particularly the bumpers.
IPC 8 full level
C23C 16/511 (2006.01); H01J 37/32 (2006.01); H05H 1/24 (2006.01); H05H 1/46 (2006.01)
CPC (source: EP US)
C23C 16/511 (2013.01 - EP US); H05H 1/46 (2013.01 - EP US); H05H 1/463 (2021.05 - EP); H05H 1/463 (2021.05 - US)
Citation (search report)
See references of WO 2009047442A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA MK RS
DOCDB simple family (publication)
FR 2921388 A1 20090327; FR 2921388 B1 20101126; CN 101802259 A 20100811; CN 101802259 B 20130213; EP 2195472 A1 20100616; JP 2010539336 A 20101216; JP 5453271 B2 20140326; US 2011045205 A1 20110224; WO 2009047442 A1 20090416
DOCDB simple family (application)
FR 0757720 A 20070920; CN 200880107800 A 20080916; EP 08837638 A 20080916; FR 2008051660 W 20080916; JP 2010525400 A 20080916; US 67923908 A 20080916