Global Patent Index - EP 2203928 A1

EP 2203928 A1 20100707 - DOUBLE PLASMA ION SOURCE

Title (en)

DOUBLE PLASMA ION SOURCE

Title (de)

DOPPELPLASMAIONENQUELLE

Title (fr)

SOURCE D'IONS A PLASMA DOUBLE

Publication

EP 2203928 A1 20100707 (EN)

Application

EP 08842593 A 20081022

Priority

  • US 2008012008 W 20081022
  • US 98157607 P 20071022

Abstract (en)

[origin: WO2009054966A1] An ion source 100, comprising a first plasma chamber 102 including a plasma generating component 104 and a first gas inlet 122 for receiving a first gas such that said plasma generating component 104 and said first gas interact to generate a first plasma within said first plasma chamber 102, wherein said first plasma chamber 102 further defines an aperture 114 for extracting electrons from said first plasma, and a second plasma chamber 116 including a second gas inlet 118 for receiving a second gas, wherein said second plasma chamber 116 further defines an aperture 117 in substantial alignment with the aperture 112 of said first plasma chamber 102, for receiving electrons extracted therefrom, such that the electrons and the second gas interact to generate a second plasma within said second plasma chamber 116, said second plasma chamber 116 further defining an extraction aperture 120 for extracting ions from said second plasma.

IPC 8 full level

H01J 37/08 (2006.01)

CPC (source: EP KR)

H01J 27/16 (2013.01 - EP); H01J 37/077 (2013.01 - EP); H01J 37/08 (2013.01 - EP KR); H01J 2237/06366 (2013.01 - EP); H01J 2237/082 (2013.01 - EP); H01J 2237/31701 (2013.01 - EP)

Citation (search report)

See references of WO 2009054966A1

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA MK RS

DOCDB simple family (publication)

WO 2009054966 A1 20090430; CN 101903970 A 20101201; EP 2203928 A1 20100707; JP 2011501382 A 20110106; JP 5524070 B2 20140618; KR 101562785 B1 20151023; KR 20100100823 A 20100915

DOCDB simple family (application)

US 2008012008 W 20081022; CN 200880121971 A 20081022; EP 08842593 A 20081022; JP 2010531026 A 20081022; KR 20107011288 A 20081022