EP 2209855 A4 20110406 - COATING COMPOSITION FOR ANTIREFLECTION, ANTIREFLECTION FILM AND METHOD FOR PREPARING THE SAME
Title (en)
COATING COMPOSITION FOR ANTIREFLECTION, ANTIREFLECTION FILM AND METHOD FOR PREPARING THE SAME
Title (de)
ANTIREFLEKTIVE BESCHICHTUNGSZUSAMMENSETZUNG, ANTIREFLEXIONSFOLIE UND HERSTELLUNGSVERFAHREN DAFÜR
Title (fr)
COMPOSITION DE REVETEMENT ANTIREFLET, FILM ANTIREFLET ET PROCEDE DE PREPARATION ASSOCIE
Publication
Application
Priority
- KR 2008006703 W 20081113
- KR 20070115329 A 20071113
- KR 20070115348 A 20071113
- KR 20070115967 A 20071114
- KR 20080035891 A 20080418
Abstract (en)
[origin: WO2009064128A2] The present invention provides a coating composition for ant iref lection that includes a low refractive material having a refractive index of 1.2 to 1.45 and a high refractive resin having a refractive index of 1.46 to 2, in which the difference in the surface energy between two materials is 5 mN/m or more; an ant iref lection film manufactured using the coating composition for ant iref lection; and a method of manufacturing the ant iref lect ion film. According to the present invention, the ant iref lect ion film having excellent abrasion resistance and antiref lection characteristic can be manufactured using a single composition by one coating process, thereby reducing manufacturing cost.
IPC 8 full level
C09D 7/12 (2006.01); C09D 7/61 (2018.01); C09D 7/65 (2018.01); G02B 1/11 (2006.01); G02B 5/30 (2006.01)
CPC (source: EP KR US)
B82B 3/00 (2013.01 - KR); C09D 5/00 (2013.01 - KR); C09D 5/006 (2013.01 - EP US); C09D 7/42 (2017.12 - EP US); C09D 7/61 (2017.12 - EP US); C09D 7/65 (2017.12 - EP US); C09D 7/67 (2017.12 - EP); C09D 7/68 (2017.12 - EP); C09D 133/08 (2013.01 - KR); C09D 183/04 (2013.01 - EP); C09D 183/08 (2013.01 - EP); G02B 1/111 (2013.01 - EP); G02B 5/3033 (2013.01 - EP); B82Y 30/00 (2013.01 - KR); C08K 3/16 (2013.01 - EP); C08K 7/22 (2013.01 - EP)
Citation (search report)
- [XI] WO 2004027517 A2 20040401 - OPTIMAX TECH CORP, et al
- [IY] EP 1083445 A1 20010314 - DAICEL CHEM [JP]
- [Y] GB 2372044 A 20020814 - SAMSUNG SDI CO LTD [KR]
- [A] US 2005038137 A1 20050217 - YOSHIHARA TOSHIO [JP], et al
- [A] EP 1418448 A1 20040512 - KONINK DSM N V [NL]
- [A] US 5699189 A 19971216 - MURPHY JOHN P [US]
- See references of WO 2009064128A2
Citation (examination)
DATABASE WPI Week 200781, Derwent World Patents Index; AN 2007-878417
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2009064128 A2 20090522; WO 2009064128 A3 20090813; CN 101855303 A 20101006; CN 101855303 B 20120905; EP 2209855 A2 20100728; EP 2209855 A4 20110406; JP 2011503658 A 20110127; KR 101009821 B1 20110119; KR 20090049558 A 20090518
DOCDB simple family (application)
KR 2008006703 W 20081113; CN 200880116007 A 20081113; EP 08849489 A 20081113; JP 2010533965 A 20081113; KR 20080112971 A 20081113