EP 2247546 B1 20160224 - TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE
Title (en)
TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE
Title (de)
TiO2-HALTIGES QUARZGLAS UND OPTISCHES ELEMENT FÜR EUV-LITHOGRAFIE MITTELS VERWENDUNG HOHER ENERGIEDICHTEN SOWIE SPEZIELLES TEMPERATURGESTEUERTES VERFAHREN FÜR SEINE HERSTELLUNG
Title (fr)
VERRE DE SILICE CONTENANT DU TIO2, ÉLÉMENT OPTIQUE POUR LITHOGRAPHIE EUV FAISANT INTERVENIR DES DENSITÉS ÉNERGÉTIQUES ÉLEVÉES, ET PROCÉDÉ COMMANDÉ PAR TEMPÉRATURE SPÉCIALE POUR LA FABRICATION D'UN TEL ÉLÉMENT OPTIQUE
Publication
Application
Priority
- JP 2009054106 W 20090226
- JP 2008044811 A 20080226
Abstract (en)
[origin: WO2009107858A1] The present invention provides a TiO2-SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12 % by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/°C, falling within the range of from 40 to 110 °C, and a standard deviation (s) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm x 30 mm in at least one plane.
IPC 8 full level
C03B 19/14 (2006.01); C03C 3/06 (2006.01); C03C 3/076 (2006.01); C03C 4/00 (2006.01)
CPC (source: EP KR US)
C03B 19/1415 (2013.01 - EP KR US); C03B 19/1453 (2013.01 - EP KR US); C03C 3/06 (2013.01 - EP KR US); C03C 3/076 (2013.01 - EP KR US); H01L 21/0275 (2013.01 - KR); C03B 2201/075 (2013.01 - EP KR US); C03B 2201/23 (2013.01 - EP KR US); C03B 2201/42 (2013.01 - EP KR US); C03B 2207/70 (2013.01 - EP KR US); C03B 2207/81 (2013.01 - EP KR US); C03C 2201/23 (2013.01 - EP KR US); C03C 2201/42 (2013.01 - EP US); C03C 2203/44 (2013.01 - EP US); C03C 2203/52 (2013.01 - EP US); C03C 2203/54 (2013.01 - EP US); Y02P 40/57 (2015.11 - EP US)
Citation (examination)
WO 2009107869 A1 20090903 - ASAHI GLASS CO LTD [JP], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2009107858 A1 20090903; CN 101959820 A 20110126; EP 2247546 A1 20101110; EP 2247546 B1 20160224; KR 20100116639 A 20101101; US 2010323871 A1 20101223; US 8178450 B2 20120515
DOCDB simple family (application)
JP 2009054106 W 20090226; CN 200980106555 A 20090226; EP 09714723 A 20090226; KR 20107018950 A 20090226; US 86890010 A 20100826