Global Patent Index - EP 2250460 A2

EP 2250460 A2 20101117 - SYSTEM AMD METHOD FOR MEASURING GAPS AND FLUSHNESSES

Title (en)

SYSTEM AMD METHOD FOR MEASURING GAPS AND FLUSHNESSES

Title (de)

SYSTEM UND VERFAHREN ZUR MESSUNG VON LÜCKEN UND BÜNDIGEN ABSCHLÜSSEN

Title (fr)

SYSTEME DE MESURE DE JEUX ET D'AFFLEUREMENTS ET PROCEDE CORRESPONDANT

Publication

EP 2250460 A2 20101117 (FR)

Application

EP 09720881 A 20090225

Priority

  • FR 2009050301 W 20090225
  • FR 0851468 A 20080306

Abstract (en)

[origin: WO2009112761A2] System (10) for measuring clearances and degree of flushness between bodywork parts (12) exhibiting respective opposite edges, characterized in that it comprises: - projection means (14) separate from and independent of the image sensors (18) able to project onto the surfaces of the parts at least one luminous line (26) cutting said edges of the parts at the location of the trace to be measured - at least two image-taking means (18) able to capture at least two images of a luminous line (26) relating to a trace to be measured at two different viewing angles, - calculating means (16) comprising an image processing module (34) intended to extract information from the images taken by the image sensors (18), in particular the values representative of the clearances and degree of flushness, - calculation means (16) comprising a calculation module (36) which makes it possible to determine by a stereoscopic method the positions and orientations of the image-taking and projection means with respect to each of the traces to be measured defined along the luminous lines (26), and to correct the values of clearances and degree of flushness previously determined by the image processing module (34).

IPC 8 full level

G01B 11/14 (2006.01); B62D 65/06 (2006.01); G01B 21/16 (2006.01); G01M 17/00 (2006.01); G06T 7/60 (2006.01)

CPC (source: EP)

B62D 65/005 (2013.01); G01B 11/14 (2013.01); G01B 11/245 (2013.01); G01B 11/2545 (2013.01)

Citation (search report)

See references of WO 2009112761A2

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA RS

DOCDB simple family (publication)

FR 2928453 A1 20090911; FR 2928453 B1 20110107; BR PI0905615 A2 20150630; CN 101952684 A 20110119; EP 2250460 A2 20101117; RU 2010140804 A 20120420; WO 2009112761 A2 20090917; WO 2009112761 A3 20091112

DOCDB simple family (application)

FR 0851468 A 20080306; BR PI0905615 A 20090225; CN 200980105259 A 20090225; EP 09720881 A 20090225; FR 2009050301 W 20090225; RU 2010140804 A 20090225