Global Patent Index - EP 2251445 A4

EP 2251445 A4 20111214 - TIAL-BASED ALLOY, PROCESS FOR PRODUCTION OF THE SAME, AND ROTOR BLADE COMPRISING THE SAME

Title (en)

TIAL-BASED ALLOY, PROCESS FOR PRODUCTION OF THE SAME, AND ROTOR BLADE COMPRISING THE SAME

Title (de)

TIAL-LEGIERUNG, HERSTELLUNGSVERFAHERN DAFÜR UND ROTORSCHAUFEL, DIE SIE UMFASST

Title (fr)

ALLIAGE À BASE DE TIAL ET SON PROCÉDÉ DE FABRICATION, ET LAME DE ROTOR LE COMPRENANT

Publication

EP 2251445 A4 20111214 (EN)

Application

EP 09720943 A 20090130

Priority

  • JP 2009051539 W 20090130
  • JP 2008062690 A 20080312

Abstract (en)

[origin: EP2251445A1] A hot-forged TiAl-based alloy having excellent oxidation resistance and high strength at high temperatures, and a process for producing such an alloy. A TiAl-based alloy comprising Al: (40+a) atomic % and Nb: b atomic %, with the remainder being Ti and unavoidable impurities, wherein a and b satisfy formulas (1) and (2) below. 0 ‰¤ a ‰¤ 2 3 + a ‰¤ b ‰¤ 7 + a Also, a TiAl-based alloy comprising Al: (40+a) atomic % and Nb: b atomic %, and further comprising one or more elements selected from the group consisting of V: c atomic %, Cr: d atomic % and Mo: e atomic %, with the remainder being Ti and unavoidable impurities, wherein a to e satisfy formulas (3) to (9) shown below. 0 ‰¤ a ‰¤ 2 3 + a ‰¤ b + 1.0 ¢ c + 1.8 ¢ d + 3.8 ¢ e ‰¤ 7 + a b ‰¥ 2 c ‰¥ 0 d ‰¥ 0 e ‰¥ 0 c + d + e > 0

IPC 8 full level

C22C 14/00 (2006.01); B21J 5/00 (2006.01); B21K 3/04 (2006.01); C22F 1/00 (2006.01); C22F 1/18 (2006.01); F01D 5/28 (2006.01); F02C 7/00 (2006.01)

CPC (source: EP US)

B21J 5/00 (2013.01 - EP US); B21K 3/04 (2013.01 - EP US); C22C 14/00 (2013.01 - EP US); C22F 1/183 (2013.01 - EP US); F05B 2220/40 (2013.01 - EP US); F05B 2230/25 (2013.01 - EP US); F05C 2201/0412 (2013.01 - EP US)

Citation (search report)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

DOCDB simple family (publication)

EP 2251445 A1 20101117; EP 2251445 A4 20111214; JP 2009215631 A 20090924; US 2010316525 A1 20101216; WO 2009113335 A1 20090917

DOCDB simple family (application)

EP 09720943 A 20090130; JP 2008062690 A 20080312; JP 2009051539 W 20090130; US 86352909 A 20090130