Global Patent Index - EP 2251914 A1

EP 2251914 A1 20101117 - Method for applying an anti-reflection layer to a silicon wafer

Title (en)

Method for applying an anti-reflection layer to a silicon wafer

Title (de)

Verfahren zum Aufbringen einer Anti-Reflexionsschicht auf einen Silizium-Wafer

Title (fr)

Procédé destiné à l'application d'une couche anti-réflexion sur une tranche de silicium

Publication

EP 2251914 A1 20101117 (DE)

Application

EP 09004431 A 20090327

Priority

EP 09004431 A 20090327

Abstract (en)

The method involves covering main surface of the wafer in liquid tight manner, where the wafer is dipped into a reservoir, which has a solution based on anions of silicic acid or anions of a salt of the silica and doped-ions of an element of the fifth main group of the periodic table. The direct current is applied between wafer and another electrode at the uncovered another main surface of the wafer. An independent claim is also included for a silicon wafer.

Abstract (de)

Die Erfindung betrifft ein Verfahren zum Aufbringen einer Anti-Reflektionsschicht auf einen Silicium-Wafer, einschließlich einer n-Dotierung der Wafer-Oberfläche und einen zugehörigen Silicium-Wafer.

IPC 8 full level

H01L 31/18 (2006.01); H01L 31/0216 (2006.01); H01L 31/068 (2012.01)

CPC (source: EP)

H01L 31/02168 (2013.01); H01L 31/068 (2013.01); H01L 31/1804 (2013.01); Y02E 10/547 (2013.01); Y02P 70/50 (2015.11)

Citation (applicant)

DE 3340874 A1 19850523 - TELEFUNKEN ELECTRONIC GMBH [DE]

Citation (search report)

Designated contracting state (EPC)

AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

Designated extension state (EPC)

AL BA RS

DOCDB simple family (publication)

DE 202009017765 U1 20100512; AT E507586 T1 20110515; DE 502009000601 D1 20110609; EP 2251914 A1 20101117; EP 2251914 B1 20110427; ES 2363305 T3 20110729

DOCDB simple family (application)

DE 202009017765 U 20090327; AT 09004431 T 20090327; DE 502009000601 T 20090327; EP 09004431 A 20090327; ES 09004431 T 20090327